Fabrication of colloidal self-assembled monolayer (SAM) using monodisperse silica and its use as a lithographic mask

Hwa Young Ko, Hae Weon Lee, Jooho Moon

Research output: Contribution to journalConference article

32 Citations (Scopus)

Abstract

Monodisperse colloidal silica with controlled sizes (100, 200 and 300 nm) has been prepared by the Stöber process. The shape and monodispersity of the synthesized colloidal particles were observed by scanning electron microscopy and laser light scattering particle analyzer. Self-assembled monolayer (SAM) of monodisperse colloids was obtained by dipping a Si substrate into a well-dispersed silica suspension. It was found that the uniformity and spatial extent of colloidal SAM were significantly influenced by the experimental parameters such as concentration, pH and surface tension of the colloidal suspension. We have observed a hexagonally well-ordered packing colloidal monolayer in a relatively large area (1.5×1.5 mm2). The platinum was sputtered over the colloidal SAM used as a lithographic mask. This produced a honeycomb-shaped patterned Pt structure of thickness ∼60 nm on the Si substrate after the removal of the colloidal silica.

Original languageEnglish
Pages (from-to)638-644
Number of pages7
JournalThin Solid Films
Volume447-448
DOIs
Publication statusPublished - 2004 Jan 30
EventProceedings of the 30th International Conference on Metallurgie - San Diego, CA, United States
Duration: 2002 Apr 282002 May 2

Fingerprint

Self assembled monolayers
Silicon Dioxide
Masks
masks
Silica
silicon dioxide
Fabrication
fabrication
colloids
Suspensions
Colloids
Substrates
Platinum
dipping
Light scattering
Surface tension
Monolayers
analyzers
interfacial tension
platinum

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

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title = "Fabrication of colloidal self-assembled monolayer (SAM) using monodisperse silica and its use as a lithographic mask",
abstract = "Monodisperse colloidal silica with controlled sizes (100, 200 and 300 nm) has been prepared by the St{\"o}ber process. The shape and monodispersity of the synthesized colloidal particles were observed by scanning electron microscopy and laser light scattering particle analyzer. Self-assembled monolayer (SAM) of monodisperse colloids was obtained by dipping a Si substrate into a well-dispersed silica suspension. It was found that the uniformity and spatial extent of colloidal SAM were significantly influenced by the experimental parameters such as concentration, pH and surface tension of the colloidal suspension. We have observed a hexagonally well-ordered packing colloidal monolayer in a relatively large area (1.5×1.5 mm2). The platinum was sputtered over the colloidal SAM used as a lithographic mask. This produced a honeycomb-shaped patterned Pt structure of thickness ∼60 nm on the Si substrate after the removal of the colloidal silica.",
author = "Ko, {Hwa Young} and Lee, {Hae Weon} and Jooho Moon",
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Fabrication of colloidal self-assembled monolayer (SAM) using monodisperse silica and its use as a lithographic mask. / Ko, Hwa Young; Lee, Hae Weon; Moon, Jooho.

In: Thin Solid Films, Vol. 447-448, 30.01.2004, p. 638-644.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Fabrication of colloidal self-assembled monolayer (SAM) using monodisperse silica and its use as a lithographic mask

AU - Ko, Hwa Young

AU - Lee, Hae Weon

AU - Moon, Jooho

PY - 2004/1/30

Y1 - 2004/1/30

N2 - Monodisperse colloidal silica with controlled sizes (100, 200 and 300 nm) has been prepared by the Stöber process. The shape and monodispersity of the synthesized colloidal particles were observed by scanning electron microscopy and laser light scattering particle analyzer. Self-assembled monolayer (SAM) of monodisperse colloids was obtained by dipping a Si substrate into a well-dispersed silica suspension. It was found that the uniformity and spatial extent of colloidal SAM were significantly influenced by the experimental parameters such as concentration, pH and surface tension of the colloidal suspension. We have observed a hexagonally well-ordered packing colloidal monolayer in a relatively large area (1.5×1.5 mm2). The platinum was sputtered over the colloidal SAM used as a lithographic mask. This produced a honeycomb-shaped patterned Pt structure of thickness ∼60 nm on the Si substrate after the removal of the colloidal silica.

AB - Monodisperse colloidal silica with controlled sizes (100, 200 and 300 nm) has been prepared by the Stöber process. The shape and monodispersity of the synthesized colloidal particles were observed by scanning electron microscopy and laser light scattering particle analyzer. Self-assembled monolayer (SAM) of monodisperse colloids was obtained by dipping a Si substrate into a well-dispersed silica suspension. It was found that the uniformity and spatial extent of colloidal SAM were significantly influenced by the experimental parameters such as concentration, pH and surface tension of the colloidal suspension. We have observed a hexagonally well-ordered packing colloidal monolayer in a relatively large area (1.5×1.5 mm2). The platinum was sputtered over the colloidal SAM used as a lithographic mask. This produced a honeycomb-shaped patterned Pt structure of thickness ∼60 nm on the Si substrate after the removal of the colloidal silica.

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