Fabrication of diffractive optical elements with grayscale photo-lithography

Wan Chin Kim, Myung Bok Lee, Jin Seung Sohn, Eun Hyung Cho, Chan Young Yoon, No Cheol Park, Young Pil Park

Research output: Contribution to journalConference article


We have developed diffractive optical element (DOE) to compensate chromatic aberration happened in aspheric lens surfaces in micro optical system. The DOE was generated with grayscale lithography using high-energy-beam-sensitive (HEBS)-glass, and we finally get DOEs having 4levels and 8levels through this fabrication.

Original languageEnglish
Pages (from-to)686-696
Number of pages11
JournalProceedings of SPIE - The International Society for Optical Engineering
Publication statusPublished - 2004 Dec 20
EventOptical Data Storage 2004 - Monterey, CA, United States
Duration: 2004 Apr 182004 Apr 21

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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