A graphite grid was fabricated using reactive ion etching with a stencil mask. The graphite film was synthesized through chemical vapor deposition on commercial Ni foil and was simply etched with a stencil mask using oxygen plasma during reactive ion etching. It had ∼85% optical transmittance at a 550-nm wavelength and ∼120 Ω/sq sheet resistance. Graphite grids placed on a human hand used to distinguish its motions showed high strain-sensing performance: its gauge factor ranged from 100 to 350, and its response times for strain loading and for release were short (10 and 80 ms, respectively). Because the graphite-based structures could be prepared in large quantities and because etching with a reusable stencil mask is very simple, mass production of high-performance motion sensors using the well-structured graphite grid is commercially feasible.
Bibliographical noteFunding Information:
This research was supported financially by a grant from the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning ( NRF-2015R1A2A1A05001844 ), and by the Center for Advanced Soft Electronics under the Global Frontier Research Program ( NRF-2012M3A6A5055744 ).
This research was supported by the Climate Change Research Hub of KAIST (Grant No. N01150139 ).
All Science Journal Classification (ASJC) codes
- Materials Science(all)