Fabrication of graphite grids via stencil lithography for highly sensitive motion sensors

Seong Jun Park, Dae Woo Kim, Sung Woo Jang, Ming Liang Jin, Seon Joon Kim, Jong Min Ok, Jong Seon Kim, Hee Tae Jung

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

A graphite grid was fabricated using reactive ion etching with a stencil mask. The graphite film was synthesized through chemical vapor deposition on commercial Ni foil and was simply etched with a stencil mask using oxygen plasma during reactive ion etching. It had ∼85% optical transmittance at a 550-nm wavelength and ∼120 Ω/sq sheet resistance. Graphite grids placed on a human hand used to distinguish its motions showed high strain-sensing performance: its gauge factor ranged from 100 to 350, and its response times for strain loading and for release were short (10 and 80 ms, respectively). Because the graphite-based structures could be prepared in large quantities and because etching with a reusable stencil mask is very simple, mass production of high-performance motion sensors using the well-structured graphite grid is commercially feasible.

Original languageEnglish
Pages (from-to)491-496
Number of pages6
JournalCarbon
Volume96
DOIs
Publication statusPublished - 2016 Jan

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)

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    Park, S. J., Kim, D. W., Jang, S. W., Jin, M. L., Kim, S. J., Ok, J. M., Kim, J. S., & Jung, H. T. (2016). Fabrication of graphite grids via stencil lithography for highly sensitive motion sensors. Carbon, 96, 491-496. https://doi.org/10.1016/j.carbon.2015.09.080