TY - GEN
T1 - Fabrication of highly resolution colloidal crystal array on patterned substrates by ink-jet printing
AU - Park, Jungho
AU - Moon, Jooho
AU - Bae, Changdeuck
AU - Shin, Hyunjung
PY - 2005
Y1 - 2005
N2 - Self-assembled colloidal patterns have been fabricated on a substrate using inkjet printing with an ink of submicron-sized monodisperse silica particles. The ink are prepared with well-dispersed suspension of monodisperse silica particles. Dot patterns are formed on both hydrophilic silicon wafer and hydrophobic silicon wafer modified with octadecyltrichlorosilane. It was found that the uniformity and spatial extent of the self-assembly within a dot were significantly influenced by the interaction of the ink with substrates and its drying behavior. For the improvement of pattern resolution, we treat a silicon wafer with OTS by a contact-printing. Chemically heterogeneous substrate has repeated stripe patterns of hydrophilic and hydrophobic properties with different relative widths. When jetting conditions are well controlled, we demonstrate to directly print the line pattern with the width of 21 μm, which is difficult to achieve by the conventional ink-jet printing. The internal and external structures of the colloidal aggregates were observed by scanning electron microscope (SEM) and confocal microscopy.
AB - Self-assembled colloidal patterns have been fabricated on a substrate using inkjet printing with an ink of submicron-sized monodisperse silica particles. The ink are prepared with well-dispersed suspension of monodisperse silica particles. Dot patterns are formed on both hydrophilic silicon wafer and hydrophobic silicon wafer modified with octadecyltrichlorosilane. It was found that the uniformity and spatial extent of the self-assembly within a dot were significantly influenced by the interaction of the ink with substrates and its drying behavior. For the improvement of pattern resolution, we treat a silicon wafer with OTS by a contact-printing. Chemically heterogeneous substrate has repeated stripe patterns of hydrophilic and hydrophobic properties with different relative widths. When jetting conditions are well controlled, we demonstrate to directly print the line pattern with the width of 21 μm, which is difficult to achieve by the conventional ink-jet printing. The internal and external structures of the colloidal aggregates were observed by scanning electron microscope (SEM) and confocal microscopy.
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M3 - Conference contribution
AN - SCOPUS:29844451864
SN - 0892082585
T3 - Digital Fabrication 2005 - Final Program and Proceedings
SP - 100
EP - 103
BT - Digital Fabrication 2005 - Final Program and Proceedings
T2 - Digital Fabrication 2005
Y2 - 18 September 2005 through 22 September 2005
ER -