Abstract
Self-assembled colloidal patterns have been fabricated on a substrate using inkjet printing with an ink of submicron-sized monodisperse silica particles. The ink are prepared with well-dispersed suspension of monodisperse silica particles. Dot patterns are formed on both hydrophilic silicon wafer and hydrophobic silicon wafer modified with octadecyltrichlorosilane. It was found that the uniformity and spatial extent of the self-assembly within a dot were significantly influenced by the interaction of the ink with substrates and its drying behavior. For the improvement of pattern resolution, we treat a silicon wafer with OTS by a contact-printing. Chemically heterogeneous substrate has repeated stripe patterns of hydrophilic and hydrophobic properties with different relative widths. When jetting conditions are well controlled, we demonstrate to directly print the line pattern with the width of 21 μm, which is difficult to achieve by the conventional ink-jet printing. The internal and external structures of the colloidal aggregates were observed by scanning electron microscope (SEM) and confocal microscopy.
| Original language | English |
|---|---|
| Title of host publication | Digital Fabrication 2005 - Final Program and Proceedings |
| Pages | 100-103 |
| Number of pages | 4 |
| Publication status | Published - 2005 Dec 1 |
| Event | Digital Fabrication 2005 - Baltimore, MD, United States Duration: 2005 Sep 18 → 2005 Sep 22 |
Other
| Other | Digital Fabrication 2005 |
|---|---|
| Country | United States |
| City | Baltimore, MD |
| Period | 05/9/18 → 05/9/22 |
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All Science Journal Classification (ASJC) codes
- Engineering(all)
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Fabrication of highly resolution colloidal crystal array on patterned substrates by ink-jet printing. / Park, Jungho; Moon, Joo Ho; Bae, Changdeuck; Shin, Hyunjung.
Digital Fabrication 2005 - Final Program and Proceedings. 2005. p. 100-103.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - Fabrication of highly resolution colloidal crystal array on patterned substrates by ink-jet printing
AU - Park, Jungho
AU - Moon, Joo Ho
AU - Bae, Changdeuck
AU - Shin, Hyunjung
PY - 2005/12/1
Y1 - 2005/12/1
N2 - Self-assembled colloidal patterns have been fabricated on a substrate using inkjet printing with an ink of submicron-sized monodisperse silica particles. The ink are prepared with well-dispersed suspension of monodisperse silica particles. Dot patterns are formed on both hydrophilic silicon wafer and hydrophobic silicon wafer modified with octadecyltrichlorosilane. It was found that the uniformity and spatial extent of the self-assembly within a dot were significantly influenced by the interaction of the ink with substrates and its drying behavior. For the improvement of pattern resolution, we treat a silicon wafer with OTS by a contact-printing. Chemically heterogeneous substrate has repeated stripe patterns of hydrophilic and hydrophobic properties with different relative widths. When jetting conditions are well controlled, we demonstrate to directly print the line pattern with the width of 21 μm, which is difficult to achieve by the conventional ink-jet printing. The internal and external structures of the colloidal aggregates were observed by scanning electron microscope (SEM) and confocal microscopy.
AB - Self-assembled colloidal patterns have been fabricated on a substrate using inkjet printing with an ink of submicron-sized monodisperse silica particles. The ink are prepared with well-dispersed suspension of monodisperse silica particles. Dot patterns are formed on both hydrophilic silicon wafer and hydrophobic silicon wafer modified with octadecyltrichlorosilane. It was found that the uniformity and spatial extent of the self-assembly within a dot were significantly influenced by the interaction of the ink with substrates and its drying behavior. For the improvement of pattern resolution, we treat a silicon wafer with OTS by a contact-printing. Chemically heterogeneous substrate has repeated stripe patterns of hydrophilic and hydrophobic properties with different relative widths. When jetting conditions are well controlled, we demonstrate to directly print the line pattern with the width of 21 μm, which is difficult to achieve by the conventional ink-jet printing. The internal and external structures of the colloidal aggregates were observed by scanning electron microscope (SEM) and confocal microscopy.
UR - http://www.scopus.com/inward/record.url?scp=29844451864&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=29844451864&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:29844451864
SN - 0892082585
SP - 100
EP - 103
BT - Digital Fabrication 2005 - Final Program and Proceedings
ER -