Fabrication of IZO transparent conducting thin films by the use of magnetron sputtering equipped with ion-beam system

Jae Hye Jung, Se Jong Lee, Hyeon Seok Hwang, Hong Koo Baik, Nam Ihn Cho

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Indium zinc oxide (IZO) thin films have been prepared on glass, polycarbonate (PC), and polyethylene terephthalate (PET) substrates by using a radio-frequency (RF) magnetron sputtering system equipped with an ion gun, and a simple OLED device was made by using IZO film. The influence of the RF power, the Ar gas volume, and the substrate temperature during the deposition process on the roughness and the electrical and optical properties of the films have been investigated. In addition, End-Hall ion-beam treatment of the substrates is applied before the sputtering deposition process. The sheet resistance of the IZO films is 25 ω/⇒ for the glass, 21 ω/⇒ for the PC, and 20 ω/⇒ for the PET substrate with a thickness of 150 nm, and the lowest root-mean-square (rms) roughness of these IZO films were measured to be 0.58, 0.35, and 0.32 nm for glass, PC, and PET substrate, respectively. The decrease in the sheet resistance of the IZO films becomes evident after the ion-beam treatment and makes the surface of the thin film more hydrophilic. Relative to non-treated IZO film, the ion-beam-treated IZO anode in the OLED device seems to inject holes into the emitting layer to enhance the current density.

Original languageEnglish
Pages (from-to)745-750
Number of pages6
JournalJournal of the Society for Information Display
Volume17
Issue number9
DOIs
Publication statusPublished - 2009 Sep 1

Fingerprint

Zinc Oxide
Indium
polycarbonate
Zinc oxide
zinc oxides
indium oxides
Magnetron sputtering
Ion beams
magnetron sputtering
Oxide films
ion beams
conduction
Fabrication
Thin films
oxide films
fabrication
Polyethylene Terephthalates
thin films
polyethylene terephthalate
polycarbonates

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

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title = "Fabrication of IZO transparent conducting thin films by the use of magnetron sputtering equipped with ion-beam system",
abstract = "Indium zinc oxide (IZO) thin films have been prepared on glass, polycarbonate (PC), and polyethylene terephthalate (PET) substrates by using a radio-frequency (RF) magnetron sputtering system equipped with an ion gun, and a simple OLED device was made by using IZO film. The influence of the RF power, the Ar gas volume, and the substrate temperature during the deposition process on the roughness and the electrical and optical properties of the films have been investigated. In addition, End-Hall ion-beam treatment of the substrates is applied before the sputtering deposition process. The sheet resistance of the IZO films is 25 ω/⇒ for the glass, 21 ω/⇒ for the PC, and 20 ω/⇒ for the PET substrate with a thickness of 150 nm, and the lowest root-mean-square (rms) roughness of these IZO films were measured to be 0.58, 0.35, and 0.32 nm for glass, PC, and PET substrate, respectively. The decrease in the sheet resistance of the IZO films becomes evident after the ion-beam treatment and makes the surface of the thin film more hydrophilic. Relative to non-treated IZO film, the ion-beam-treated IZO anode in the OLED device seems to inject holes into the emitting layer to enhance the current density.",
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Fabrication of IZO transparent conducting thin films by the use of magnetron sputtering equipped with ion-beam system. / Jung, Jae Hye; Lee, Se Jong; Hwang, Hyeon Seok; Baik, Hong Koo; Cho, Nam Ihn.

In: Journal of the Society for Information Display, Vol. 17, No. 9, 01.09.2009, p. 745-750.

Research output: Contribution to journalArticle

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