A cost-effective method to fabricate metallic nano stamp with full tracks of nano hole patterns with diameter of 30 nm and pitch of 50 nm was developed for nanoreplicating nano patterned substrate. Electron-beam recording (EBR) and inductively coupled plasma etching process were used in order to fabricate the original silicon master with hole patterns. Polymeric master with full tracks of nano pillar patterns was replicated from the original silicon master by UV nanoimprinting process. For the successful releasing during UV nanoimprinting process, self assembled monolayer of fluoroctatrichlorosilane was deposited on the original silicon master. With this approach, the expensive silicon master could be reused many times as a master mold. Nickel seed layer as conductive layer was deposited onto the polymeric master using sputtering process. Nanoelectroforming process using nickel sulfamate solution was used to fabricate metallic nano stamp. Metallic nano stamp with full tracks of hole patterns having diameter of 30 nm, pitch of 50 nm, track width of 1.3 mm, and track inner diameter of 40 mm was successfully fabricated. The present method will provide an important mean to mass fabricate patterned media.
Bibliographical noteFunding Information:
ACKNOWLEDGMENT This work was supported by the Korea Science and Engineering Foundation (KOSEF) under a grant funded by the Korea government (MOST) (No. R0A-2004-000-10368-0).
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering