Fabrication of molecular scale photodiode using phase separation technique

Kyung Sang Cho, Won Hong Lee, Dongho Kim, Jeong Woo Choi

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Abstract

A molecular-level photodiode was fabricated using a phase separation technique. The separated phase of a stacked layer of flavin (sensitizer (S))-ODTCS (octadecyl trichlorosilane) mixture and PFCA (nonadecafluoro-decanoic acid) was constructed and observed by AFM. Based on this structure, a submicron scale electron donor (D)/S/relay (R)/acceptor (A) molecular photodiode was fabricated on the silicon wafer substrate by the LB method. The morphology of the device was confirmed by AFM. The photodiode effect of the molecular device was observed using STM. The molecular scale photodiode and photoswitching effect could be verified.

Original languageEnglish
Pages (from-to)319-322
Number of pages4
JournalMolecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume349
DOIs
Publication statusPublished - 2000 Jan 1
EventProceedings of the Korea-Japan Joint Forum 1999 Organic Materials for Electronics and Photonics - Kyongju, South Korea
Duration: 1999 Sep 91999 Sep 11

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All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

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