Fabrication of multi-layer CVD-SiC films with different microstructures by manipulating the input gas ratio

J. H. Oh, Doo Jin Choi

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Multi-layer CVD-SiC films that have granular type and faceted structures were successfully fabricated by manipulating the input gas ratio in a continuous process. The surface morphology of the multilayer depended on the microstructure of the bottom layer. From TEM analysis, abnormal growth was found at α = 4.

Original languageEnglish
Pages (from-to)2043-2046
Number of pages4
JournalJournal of Materials Science Letters
Volume19
Issue number22
DOIs
Publication statusPublished - 2000 Jan 1

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Surface morphology
Chemical vapor deposition
Multilayers
Gases
Transmission electron microscopy
Fabrication
Microstructure

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this

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abstract = "Multi-layer CVD-SiC films that have granular type and faceted structures were successfully fabricated by manipulating the input gas ratio in a continuous process. The surface morphology of the multilayer depended on the microstructure of the bottom layer. From TEM analysis, abnormal growth was found at α = 4.",
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Fabrication of multi-layer CVD-SiC films with different microstructures by manipulating the input gas ratio. / Oh, J. H.; Choi, Doo Jin.

In: Journal of Materials Science Letters, Vol. 19, No. 22, 01.01.2000, p. 2043-2046.

Research output: Contribution to journalArticle

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