Fabrication of multi-layer CVD-SiC films with different microstructures by manipulating the input gas ratio

J. H. Oh, Doo Jin Choi

Research output: Contribution to journalArticle

4 Citations (Scopus)


Multi-layer CVD-SiC films that have granular type and faceted structures were successfully fabricated by manipulating the input gas ratio in a continuous process. The surface morphology of the multilayer depended on the microstructure of the bottom layer. From TEM analysis, abnormal growth was found at α = 4.

Original languageEnglish
Pages (from-to)2043-2046
Number of pages4
JournalJournal of Materials Science Letters
Issue number22
Publication statusPublished - 2000 Jan 1


All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this