Fabrication of multi-layer CVD-SiC films with different microstructures by manipulating the input gas ratio

J. H. Oh, D. J. Choi

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Multi-layer CVD-SiC films that have granular type and faceted structures were successfully fabricated by manipulating the input gas ratio in a continuous process. The surface morphology of the multilayer depended on the microstructure of the bottom layer. From TEM analysis, abnormal growth was found at α = 4.

Original languageEnglish
Pages (from-to)2043-2046
Number of pages4
JournalJournal of Materials Science Letters
Volume19
Issue number22
DOIs
Publication statusPublished - 2000 Nov

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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