Fabrication of patterned inorganic-organic hybrid film for the optical waveguide by microfluidic lithography

Inorganic-organic hybrid materials for the optical wave-guide were synthesized by the sol-gel process starting from the acid-catalyzed solutions of phenyltrimethoxysilane, methyltriethoxysilane, and tetraethylorthosilicate. The control of the refractive index in the organically modified silicate films was achieved by varying the content of phenyltrimethoxysilane incorporated as a refractive index modifier. A single spin-coating with the precursor solution produced a crack-free buffer layer of 22-μm thickness with a dense microstructure. For the fabrication of the patterned guiding layer on top of the buffer layer, the microfluidic lithography method was used. The patterned microlines of the linewidth of 20-35 μm with a sharp edge definition could form by filling the precursor solutions into the microchannels associated with the polydimethylsiloxane microfluidic device. The patterned guiding layer was optically transparent as similar as the bare quartz glass at the wavelength above 500 nm and had a low propagation loss of 0.77 dB/cm at 1310 nm.