Fabrication of photo-patternable inorganic-organic hybrid film by spin-coating

Sunho Jeong, Woo Hyuk Jang, Jooho Moon

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)


Organically modified silicate (ORMOSIL) was synthesized by the sol-gel process. The control of the refractive index was achieved by varying the content of phenyltrimethoxysilane as a refractive index modifier. The refractive index variations as a function of UV illumination and baking conditions were analyzed using Fourier transform infrared spectrometer. Incorporation of 3-(trimethoxysilyl)propylmethacrylate as a UV-sensitive functional group allowed to obtain high-resolution patterned films with 7 μm linewidth using a conventional photo-lithography. Relatively thick layers of ORMOSIL film with 11 μm thickness were obtained by a single spin-coating without producing any crack. Heat-treatment at temperatures lower than 150 °C resulted in inorganic-organic hybrid films that exhibited dense microstructure.

Original languageEnglish
Pages (from-to)204-208
Number of pages5
JournalThin Solid Films
Issue number1-2
Publication statusPublished - 2004 Nov 1

Bibliographical note

Funding Information:
This work has been supported by the Electro-0580 project from the Ministry of Commerce, Industry and Energy.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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