Fabrication of photo-patternable inorganic-organic hybrid film by spin-coating

Sunho Jeong; Woo Hyuk Jang; Jooho Moon

doi:10.1016/j.tsf.2004.01.118

Fabrication of photo-patternable inorganic-organic hybrid film by spin-coating

Sunho Jeong, Woo Hyuk Jang, Jooho Moon

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

30 Citations (Scopus)

Abstract

Organically modified silicate (ORMOSIL) was synthesized by the sol-gel process. The control of the refractive index was achieved by varying the content of phenyltrimethoxysilane as a refractive index modifier. The refractive index variations as a function of UV illumination and baking conditions were analyzed using Fourier transform infrared spectrometer. Incorporation of 3-(trimethoxysilyl)propylmethacrylate as a UV-sensitive functional group allowed to obtain high-resolution patterned films with 7 μm linewidth using a conventional photo-lithography. Relatively thick layers of ORMOSIL film with 11 μm thickness were obtained by a single spin-coating without producing any crack. Heat-treatment at temperatures lower than 150 °C resulted in inorganic-organic hybrid films that exhibited dense microstructure.

Original language	English
Pages (from-to)	204-208
Number of pages	5
Journal	Thin Solid Films
Volume	466
Issue number	1-2
DOIs	https://doi.org/10.1016/j.tsf.2004.01.118
Publication status	Published - 2004 Nov 1

Bibliographical note

Funding Information:
This work has been supported by the Electro-0580 project from the Ministry of Commerce, Industry and Energy.

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2004.01.118

Cite this

@article{e562c4caf8ed4b60a90de8a53f54e746,

title = "Fabrication of photo-patternable inorganic-organic hybrid film by spin-coating",

abstract = "Organically modified silicate (ORMOSIL) was synthesized by the sol-gel process. The control of the refractive index was achieved by varying the content of phenyltrimethoxysilane as a refractive index modifier. The refractive index variations as a function of UV illumination and baking conditions were analyzed using Fourier transform infrared spectrometer. Incorporation of 3-(trimethoxysilyl)propylmethacrylate as a UV-sensitive functional group allowed to obtain high-resolution patterned films with 7 μm linewidth using a conventional photo-lithography. Relatively thick layers of ORMOSIL film with 11 μm thickness were obtained by a single spin-coating without producing any crack. Heat-treatment at temperatures lower than 150 °C resulted in inorganic-organic hybrid films that exhibited dense microstructure.",

author = "Sunho Jeong and Jang, {Woo Hyuk} and Jooho Moon",

note = "Funding Information: This work has been supported by the Electro-0580 project from the Ministry of Commerce, Industry and Energy.",

year = "2004",

month = nov,

day = "1",

doi = "10.1016/j.tsf.2004.01.118",

language = "English",

volume = "466",

pages = "204--208",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "1-2",

}

TY - JOUR

T1 - Fabrication of photo-patternable inorganic-organic hybrid film by spin-coating

AU - Jeong, Sunho

AU - Jang, Woo Hyuk

AU - Moon, Jooho

N1 - Funding Information: This work has been supported by the Electro-0580 project from the Ministry of Commerce, Industry and Energy.

PY - 2004/11/1

Y1 - 2004/11/1

N2 - Organically modified silicate (ORMOSIL) was synthesized by the sol-gel process. The control of the refractive index was achieved by varying the content of phenyltrimethoxysilane as a refractive index modifier. The refractive index variations as a function of UV illumination and baking conditions were analyzed using Fourier transform infrared spectrometer. Incorporation of 3-(trimethoxysilyl)propylmethacrylate as a UV-sensitive functional group allowed to obtain high-resolution patterned films with 7 μm linewidth using a conventional photo-lithography. Relatively thick layers of ORMOSIL film with 11 μm thickness were obtained by a single spin-coating without producing any crack. Heat-treatment at temperatures lower than 150 °C resulted in inorganic-organic hybrid films that exhibited dense microstructure.

AB - Organically modified silicate (ORMOSIL) was synthesized by the sol-gel process. The control of the refractive index was achieved by varying the content of phenyltrimethoxysilane as a refractive index modifier. The refractive index variations as a function of UV illumination and baking conditions were analyzed using Fourier transform infrared spectrometer. Incorporation of 3-(trimethoxysilyl)propylmethacrylate as a UV-sensitive functional group allowed to obtain high-resolution patterned films with 7 μm linewidth using a conventional photo-lithography. Relatively thick layers of ORMOSIL film with 11 μm thickness were obtained by a single spin-coating without producing any crack. Heat-treatment at temperatures lower than 150 °C resulted in inorganic-organic hybrid films that exhibited dense microstructure.

UR - http://www.scopus.com/inward/record.url?scp=4544344731&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=4544344731&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2004.01.118

DO - 10.1016/j.tsf.2004.01.118

M3 - Article

AN - SCOPUS:4544344731

SN - 0040-6090

VL - 466

SP - 204

EP - 208

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2

ER -

Fabrication of photo-patternable inorganic-organic hybrid film by spin-coating

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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