Organically modified silicate (ORMOSIL) was synthesized by the sol-gel process. The control of the refractive index was achieved by varying the content of phenyltrimethoxysilane as a refractive index modifier. The refractive index variations as a function of UV illumination and baking conditions were analyzed using Fourier transform infrared spectrometer. Incorporation of 3-(trimethoxysilyl)propylmethacrylate as a UV-sensitive functional group allowed to obtain high-resolution patterned films with 7 μm linewidth using a conventional photo-lithography. Relatively thick layers of ORMOSIL film with 11 μm thickness were obtained by a single spin-coating without producing any crack. Heat-treatment at temperatures lower than 150 °C resulted in inorganic-organic hybrid films that exhibited dense microstructure.
Bibliographical noteFunding Information:
This work has been supported by the Electro-0580 project from the Ministry of Commerce, Industry and Energy.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry