Fabrication of porous noble metal thin-film electrode by reactive magnetron sputtering

Tae Shin Cho, Heonjin Choi, Joosun Kim

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Porous platinum films have been fabricated by reactive sputtering combined with subsequent thermal annealing. Using the SEM, XRD, XPS, and polarization resistance measurement techniques, the microstructural development of the film and its resultant electrochemical properties have been characterized. Pore evolution was understood as a result of the thermal grooving of platinum during annealing process. We demonstrated that crystallization should be followed by agglomeration for the evolution of porous microstructures. Furthermore, reaction sputtering affected the adhesion enhancement between the film and substrate compared to the film deposited by non-reactive sputtering. The polarization resistance of the porous platinum film was five times lower than that of the dense platinum film. At 600 °C the resistance of the porous film was 5.67 Ω ·cm2, and that of the dense film was 38 Ω·cm2.

Original languageEnglish
Pages (from-to)4265-4270
Number of pages6
JournalJournal of Nanoscience and Nanotechnology
Volume13
Issue number6
DOIs
Publication statusPublished - 2013 Jun 1

Fingerprint

Reactive sputtering
Precious metals
noble metals
Magnetron sputtering
magnetron sputtering
Fabrication
Thin films
Electrodes
fabrication
electrodes
thin films
Platinum
platinum
sputtering
Sputtering
Annealing
Polarization
grooving
annealing
polarization

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

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Fabrication of porous noble metal thin-film electrode by reactive magnetron sputtering. / Cho, Tae Shin; Choi, Heonjin; Kim, Joosun.

In: Journal of Nanoscience and Nanotechnology, Vol. 13, No. 6, 01.06.2013, p. 4265-4270.

Research output: Contribution to journalArticle

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