Fabrication of single-electron tunneling devices

K. H. Yoo, J. C. Park, J. W. Park, J. B. Choi

Research output: Contribution to journalConference article

Abstract

We have fabricated very small Al/AlOx/Al junctions connected in series using electron-beam lithography and double-angle evaporation techniques. The average junction area is obtained to be 150 × 150 nm2. The properties of these junctions will be discussed in the conference.

Original languageEnglish
Pages (from-to)263-264
Number of pages2
JournalCPEM Digest (Conference on Precision Electromagnetic Measurements)
Publication statusPublished - 1996 Jan 1
EventProceedings of the 1996 Conference on Precision Electromagnetic Measurements - Braunschweig, Ger
Duration: 1996 Jun 171996 Jun 20

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Electrical and Electronic Engineering

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