Fabrication of sub 50-nm direct-patterned Pb(Zr,Ti)O3 films by electron beam-induced metal-organic deposition

Hyeong Ho Park, Hong Sub Lee, Hyung-Ho Park, Xin Zhang, Ross H. Hill

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Direct-patterned lead zirconate titanate (PZT) films prepared from an electron beam sensitive stock solution were investigated for advanced stage applications in sub 50-nm patterned systems. The required electron beam dose for the direct-patterning of PZT precursor films was 4.5 mC/cm2. The PZT precursor films with pattern size of 500×500 μm2 were exposed to an electron beam for 2 h and annealed at 400°C for 30 min under an O2 ambient. After exposure and annealing, values of the remnant polarization and coercive field were 7.0 μC/cm2 and 97 kV/cm at 10 V, respectively. These results suggest a possible application of PZT films in micro- or nanoelectromechanical systems.

Original languageEnglish
Pages (from-to)214-218
Number of pages5
JournalJournal of Electroceramics
Volume24
Issue number3
DOIs
Publication statusPublished - 2010 May 1

Fingerprint

Electron beams
Lead
Metals
electron beams
Fabrication
fabrication
metals
NEMS
MEMS
Annealing
Polarization
dosage
annealing
lead titanate zirconate
polarization

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Mechanics of Materials
  • Materials Chemistry
  • Electrical and Electronic Engineering

Cite this

Park, Hyeong Ho ; Lee, Hong Sub ; Park, Hyung-Ho ; Zhang, Xin ; Hill, Ross H. / Fabrication of sub 50-nm direct-patterned Pb(Zr,Ti)O3 films by electron beam-induced metal-organic deposition. In: Journal of Electroceramics. 2010 ; Vol. 24, No. 3. pp. 214-218.
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Fabrication of sub 50-nm direct-patterned Pb(Zr,Ti)O3 films by electron beam-induced metal-organic deposition. / Park, Hyeong Ho; Lee, Hong Sub; Park, Hyung-Ho; Zhang, Xin; Hill, Ross H.

In: Journal of Electroceramics, Vol. 24, No. 3, 01.05.2010, p. 214-218.

Research output: Contribution to journalArticle

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AU - Hill, Ross H.

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AB - Direct-patterned lead zirconate titanate (PZT) films prepared from an electron beam sensitive stock solution were investigated for advanced stage applications in sub 50-nm patterned systems. The required electron beam dose for the direct-patterning of PZT precursor films was 4.5 mC/cm2. The PZT precursor films with pattern size of 500×500 μm2 were exposed to an electron beam for 2 h and annealed at 400°C for 30 min under an O2 ambient. After exposure and annealing, values of the remnant polarization and coercive field were 7.0 μC/cm2 and 97 kV/cm at 10 V, respectively. These results suggest a possible application of PZT films in micro- or nanoelectromechanical systems.

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