Fabrication of sub 50-nm direct-patterned Pb(Zr,Ti)O3 films by electron beam-induced metal-organic deposition

Hyeong Ho Park, Hong Sub Lee, Hyung Ho Park, Xin Zhang, Ross H. Hill

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6 Citations (Scopus)


Direct-patterned lead zirconate titanate (PZT) films prepared from an electron beam sensitive stock solution were investigated for advanced stage applications in sub 50-nm patterned systems. The required electron beam dose for the direct-patterning of PZT precursor films was 4.5 mC/cm2. The PZT precursor films with pattern size of 500×500 μm2 were exposed to an electron beam for 2 h and annealed at 400°C for 30 min under an O2 ambient. After exposure and annealing, values of the remnant polarization and coercive field were 7.0 μC/cm2 and 97 kV/cm at 10 V, respectively. These results suggest a possible application of PZT films in micro- or nanoelectromechanical systems.

Original languageEnglish
Pages (from-to)214-218
Number of pages5
JournalJournal of Electroceramics
Issue number3
Publication statusPublished - 2010 May

Bibliographical note

Funding Information:
Acknowledgements This work was supported by the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund) (KRF-2006-311-D00636). The experiments performed at the PLS were supported in part by the MOST and the POSTECH.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Mechanics of Materials
  • Electrical and Electronic Engineering
  • Materials Chemistry


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