Fabrication of van der Waals heterostructures through direct growth of rhenium disulfide on van der Waals surfaces

Jaeho Jeon, Haeju Choi, Sungpyo Baek, Seunghyuk Choi, Jeong Ho Cho, Sungjoo Lee

Research output: Contribution to journalArticlepeer-review

Abstract

The growth of van der Waals (vdW) heterostructures has been desired to achieve two-dimensional (2D) layered heterostructures with various types of junctions for new functional device applications. ReS2 is one of the most promising semiconducting 2D materials for providing new electronic and optoelectronic properties when integrated into a vdW heterostructure. However, owing to its low-symmetry distorted 1T crystalline structure, there are few reports on continuous high-quality vdW heterostructures unlike those on 2D materials with a symmetric 2H crystalline structure. Herein, we report on the first demonstrated ReS2/HfS2 and ReS2/h-BN vdW heterostructures through the direct growth of ReS2 films on exfoliated HfS2 and h-BN with symmetric 1T (HfS2) and 2H (h-BN) crystalline structures. Few-layered continuous ReS2 films were grown on vdW surfaces of exfoliated 2D material flakes with highly crystalline structures, and the growth behavior is explained through a surface-dependent direct growth process with vdW epitaxy. This work verifies that symmetry-free direct growth of 2D vdW heterostructures can be achieved using a 2D material as the growth template with a high growth rate, which provides a path for developing various types of multi-functional vdW heterostructures.

Original languageEnglish
Article number148865
JournalApplied Surface Science
Volume544
DOIs
Publication statusPublished - 2021 Apr 1

Bibliographical note

Funding Information:
This work was supported by the Postdoctoral Research Program of Sungkyunkwan University (2019). This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Korean government (grant numbers: 2018R1D1A1A09081931 and 2020R1A4A2002806). This work was supported by Samsung Electronics Co. Ltd (IO201215-08197-01).

Publisher Copyright:
© 2020

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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