Facet reflectivity of antireflection-coated electroabsorption waveguide measured from photocurrent

Byung Kwon Kang, Yoon Ho Park, Seok Lee, Sun Ho Kim, Sang Sam Choi, Jungkeun Lee, Takeshi Kamiya, Seung Han Park

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A method to measure the low reflectivity of antireflection (AR)-coated electroabsorption (EA) waveguide facets by using the photocurrent is presented. The method is simple and efficient.

Original languageEnglish
Pages (from-to)500-501
Number of pages2
JournalConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Volume2
Publication statusPublished - 2000 Jan 1

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Photocurrents
Waveguides

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Kang, Byung Kwon ; Park, Yoon Ho ; Lee, Seok ; Kim, Sun Ho ; Choi, Sang Sam ; Lee, Jungkeun ; Kamiya, Takeshi ; Park, Seung Han. / Facet reflectivity of antireflection-coated electroabsorption waveguide measured from photocurrent. In: Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS. 2000 ; Vol. 2. pp. 500-501.
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Facet reflectivity of antireflection-coated electroabsorption waveguide measured from photocurrent. / Kang, Byung Kwon; Park, Yoon Ho; Lee, Seok; Kim, Sun Ho; Choi, Sang Sam; Lee, Jungkeun; Kamiya, Takeshi; Park, Seung Han.

In: Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS, Vol. 2, 01.01.2000, p. 500-501.

Research output: Contribution to journalArticle

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AU - Kang, Byung Kwon

AU - Park, Yoon Ho

AU - Lee, Seok

AU - Kim, Sun Ho

AU - Choi, Sang Sam

AU - Lee, Jungkeun

AU - Kamiya, Takeshi

AU - Park, Seung Han

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