Facile fabrication of sub-20-nm nanochannels based on crystallinity- dependent anisotropic etching of silicon

Youngsup Song, Min Ook Kim, Dae Sung Kwon, Yong-Jun Kim, Jongbaeg Kim

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We developed a novel method to fabricate nanochannels with simple and facile process utilizing the crystallinity-dependent anisotropic wet etching of silicon. The nanochannels were formed in bulk (1 1 1)-oriented single-crystalline silicon wafer by single step of microscale lithography and sealed by thin film deposition. Hence the massively parallel and wafer scale nanochannel fabrication was easily achieved without the necessity of nanolithography or complicated process. The dimension of the fabricated nanochannels was down to 16 nm in depth and 175 nm in width, and up to 8 cm in length.

Original languageEnglish
Pages (from-to)309-312
Number of pages4
JournalMicroelectronic Engineering
Volume98
DOIs
Publication statusPublished - 2012 Oct 1

Fingerprint

Nanolithography
Anisotropic etching
Wet etching
Silicon
Silicon wafers
Lithography
crystallinity
etching
wafers
Crystalline materials
Fabrication
Thin films
fabrication
silicon
microbalances
lithography
thin films

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

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abstract = "We developed a novel method to fabricate nanochannels with simple and facile process utilizing the crystallinity-dependent anisotropic wet etching of silicon. The nanochannels were formed in bulk (1 1 1)-oriented single-crystalline silicon wafer by single step of microscale lithography and sealed by thin film deposition. Hence the massively parallel and wafer scale nanochannel fabrication was easily achieved without the necessity of nanolithography or complicated process. The dimension of the fabricated nanochannels was down to 16 nm in depth and 175 nm in width, and up to 8 cm in length.",
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Facile fabrication of sub-20-nm nanochannels based on crystallinity- dependent anisotropic etching of silicon. / Song, Youngsup; Kim, Min Ook; Kwon, Dae Sung; Kim, Yong-Jun; Kim, Jongbaeg.

In: Microelectronic Engineering, Vol. 98, 01.10.2012, p. 309-312.

Research output: Contribution to journalArticle

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T1 - Facile fabrication of sub-20-nm nanochannels based on crystallinity- dependent anisotropic etching of silicon

AU - Song, Youngsup

AU - Kim, Min Ook

AU - Kwon, Dae Sung

AU - Kim, Yong-Jun

AU - Kim, Jongbaeg

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AB - We developed a novel method to fabricate nanochannels with simple and facile process utilizing the crystallinity-dependent anisotropic wet etching of silicon. The nanochannels were formed in bulk (1 1 1)-oriented single-crystalline silicon wafer by single step of microscale lithography and sealed by thin film deposition. Hence the massively parallel and wafer scale nanochannel fabrication was easily achieved without the necessity of nanolithography or complicated process. The dimension of the fabricated nanochannels was down to 16 nm in depth and 175 nm in width, and up to 8 cm in length.

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