We developed a novel method to fabricate nanochannels with simple and facile process utilizing the crystallinity-dependent anisotropic wet etching of silicon. The nanochannels were formed in bulk (1 1 1)-oriented single-crystalline silicon wafer by single step of microscale lithography and sealed by thin film deposition. Hence the massively parallel and wafer scale nanochannel fabrication was easily achieved without the necessity of nanolithography or complicated process. The dimension of the fabricated nanochannels was down to 16 nm in depth and 175 nm in width, and up to 8 cm in length.
Bibliographical noteFunding Information:
This research was supported by Basic Science Research Program (2011-0002585), the Fusion Research Program for Green Technologies (2011-0000005) through the National Research Foundation of Korea (NRF), the Converging Research Center Program (2011K000756) funded by the Ministry of Education, Science and Technology, and Korea Ministry of Environment as “Converging technology project”.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering