Facile nanopatterning of zirconium dioxide films via direct ultraviolet-assisted nanoimprint lithography

Hyeong Ho Park, Xin Zhang, Soon Won Lee, Ki Don Kim, Dae Geun Choi, Jun Hyuk Choi, Jihye Lee, Eung Sug Lee, Hyung-Ho Park, Ross H. Hill, Jun Ho Jeong

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive zirconyl 2-ethylhexanoate is presented for the fabrication of both amorphous and crystalline zirconium dioxide (ZrO2) nanostructures. Upon annealing at 400 °C for 1 h, the lateral shrinkage and thickness shrinkage of ZrO2 nanostructures were 69.8 and 66.7%, respectively, indicating an isotropic volume loss. During UV irradiation and annealing treatment, the refractive index of UV-irradiated ZrO2 film is gradually increased by improvement in the packing density and crystallinity of the film. With increasing UV exposure time and annealing temperature, the optical band gap (Eg) of the UV-irradiated ZrO2 film is red-shifted from 5.745 to 5.265 eV, due to the removal of organic groups and the resultant densification of the film during the photochemical reaction and the heat-induced increase in the crystallinity of the film. These results suggest that the refractive index and optical Eg of ZrO2 nanostructures could be controlled by tuning the conditions of UV exposure time and annealing treatment. Nanopatterns of ZrO2, fabricated by direct UV-assisted nanoimprint lithography, are potential candidates for protective coatings for optical mirrors and filters, e.g. high-reflectivity mirrors and broadband interference filters, as well as active electro-optical devices where ordered surface nanostructures are necessary.

Original languageEnglish
Pages (from-to)657-662
Number of pages6
JournalJournal of Materials Chemistry
Volume21
Issue number3
DOIs
Publication statusPublished - 2011 Jan 21

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Nanoimprint lithography
Zirconium
Nanostructures
Annealing
Refractive index
Electrooptical devices
Wave filters
Active filters
Photochemical reactions
Optical band gaps
Protective coatings
Densification
Tuning
zirconium oxide
Irradiation
Crystalline materials
Fabrication

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Chemistry

Cite this

Park, H. H., Zhang, X., Lee, S. W., Kim, K. D., Choi, D. G., Choi, J. H., ... Jeong, J. H. (2011). Facile nanopatterning of zirconium dioxide films via direct ultraviolet-assisted nanoimprint lithography. Journal of Materials Chemistry, 21(3), 657-662. https://doi.org/10.1039/c0jm01403f
Park, Hyeong Ho ; Zhang, Xin ; Lee, Soon Won ; Kim, Ki Don ; Choi, Dae Geun ; Choi, Jun Hyuk ; Lee, Jihye ; Lee, Eung Sug ; Park, Hyung-Ho ; Hill, Ross H. ; Jeong, Jun Ho. / Facile nanopatterning of zirconium dioxide films via direct ultraviolet-assisted nanoimprint lithography. In: Journal of Materials Chemistry. 2011 ; Vol. 21, No. 3. pp. 657-662.
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abstract = "A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive zirconyl 2-ethylhexanoate is presented for the fabrication of both amorphous and crystalline zirconium dioxide (ZrO2) nanostructures. Upon annealing at 400 °C for 1 h, the lateral shrinkage and thickness shrinkage of ZrO2 nanostructures were 69.8 and 66.7{\%}, respectively, indicating an isotropic volume loss. During UV irradiation and annealing treatment, the refractive index of UV-irradiated ZrO2 film is gradually increased by improvement in the packing density and crystallinity of the film. With increasing UV exposure time and annealing temperature, the optical band gap (Eg) of the UV-irradiated ZrO2 film is red-shifted from 5.745 to 5.265 eV, due to the removal of organic groups and the resultant densification of the film during the photochemical reaction and the heat-induced increase in the crystallinity of the film. These results suggest that the refractive index and optical Eg of ZrO2 nanostructures could be controlled by tuning the conditions of UV exposure time and annealing treatment. Nanopatterns of ZrO2, fabricated by direct UV-assisted nanoimprint lithography, are potential candidates for protective coatings for optical mirrors and filters, e.g. high-reflectivity mirrors and broadband interference filters, as well as active electro-optical devices where ordered surface nanostructures are necessary.",
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Park, HH, Zhang, X, Lee, SW, Kim, KD, Choi, DG, Choi, JH, Lee, J, Lee, ES, Park, H-H, Hill, RH & Jeong, JH 2011, 'Facile nanopatterning of zirconium dioxide films via direct ultraviolet-assisted nanoimprint lithography', Journal of Materials Chemistry, vol. 21, no. 3, pp. 657-662. https://doi.org/10.1039/c0jm01403f

Facile nanopatterning of zirconium dioxide films via direct ultraviolet-assisted nanoimprint lithography. / Park, Hyeong Ho; Zhang, Xin; Lee, Soon Won; Kim, Ki Don; Choi, Dae Geun; Choi, Jun Hyuk; Lee, Jihye; Lee, Eung Sug; Park, Hyung-Ho; Hill, Ross H.; Jeong, Jun Ho.

In: Journal of Materials Chemistry, Vol. 21, No. 3, 21.01.2011, p. 657-662.

Research output: Contribution to journalArticle

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T1 - Facile nanopatterning of zirconium dioxide films via direct ultraviolet-assisted nanoimprint lithography

AU - Park, Hyeong Ho

AU - Zhang, Xin

AU - Lee, Soon Won

AU - Kim, Ki Don

AU - Choi, Dae Geun

AU - Choi, Jun Hyuk

AU - Lee, Jihye

AU - Lee, Eung Sug

AU - Park, Hyung-Ho

AU - Hill, Ross H.

AU - Jeong, Jun Ho

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Y1 - 2011/1/21

N2 - A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive zirconyl 2-ethylhexanoate is presented for the fabrication of both amorphous and crystalline zirconium dioxide (ZrO2) nanostructures. Upon annealing at 400 °C for 1 h, the lateral shrinkage and thickness shrinkage of ZrO2 nanostructures were 69.8 and 66.7%, respectively, indicating an isotropic volume loss. During UV irradiation and annealing treatment, the refractive index of UV-irradiated ZrO2 film is gradually increased by improvement in the packing density and crystallinity of the film. With increasing UV exposure time and annealing temperature, the optical band gap (Eg) of the UV-irradiated ZrO2 film is red-shifted from 5.745 to 5.265 eV, due to the removal of organic groups and the resultant densification of the film during the photochemical reaction and the heat-induced increase in the crystallinity of the film. These results suggest that the refractive index and optical Eg of ZrO2 nanostructures could be controlled by tuning the conditions of UV exposure time and annealing treatment. Nanopatterns of ZrO2, fabricated by direct UV-assisted nanoimprint lithography, are potential candidates for protective coatings for optical mirrors and filters, e.g. high-reflectivity mirrors and broadband interference filters, as well as active electro-optical devices where ordered surface nanostructures are necessary.

AB - A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive zirconyl 2-ethylhexanoate is presented for the fabrication of both amorphous and crystalline zirconium dioxide (ZrO2) nanostructures. Upon annealing at 400 °C for 1 h, the lateral shrinkage and thickness shrinkage of ZrO2 nanostructures were 69.8 and 66.7%, respectively, indicating an isotropic volume loss. During UV irradiation and annealing treatment, the refractive index of UV-irradiated ZrO2 film is gradually increased by improvement in the packing density and crystallinity of the film. With increasing UV exposure time and annealing temperature, the optical band gap (Eg) of the UV-irradiated ZrO2 film is red-shifted from 5.745 to 5.265 eV, due to the removal of organic groups and the resultant densification of the film during the photochemical reaction and the heat-induced increase in the crystallinity of the film. These results suggest that the refractive index and optical Eg of ZrO2 nanostructures could be controlled by tuning the conditions of UV exposure time and annealing treatment. Nanopatterns of ZrO2, fabricated by direct UV-assisted nanoimprint lithography, are potential candidates for protective coatings for optical mirrors and filters, e.g. high-reflectivity mirrors and broadband interference filters, as well as active electro-optical devices where ordered surface nanostructures are necessary.

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