Ferroelectric property improvement of poly(vinylidene fluoride/ trifluoroethylene) polymer exposed to a plasma ambient

C. H. Park, Kwang H. Lee, Taewoo Ha, Jae Hoon Kim, Seongil Im, Jungheum Yun, Gun Hwan Lee

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We report a dramatic property improvement of ferroelectric polymer poly(vinylidene fluoride/trifluoroethylene) [P(VDF-TrFE)] upon exposure to a plasma ambient. The P(VDF-TrFE) layer for typical nonvolatile memory devices shows only ∼6.5 μC/ cm2 and 0.55 MV/cm for its remnant polarization and coercive field, respectively, but the values increase to ∼13 xμC/ cm2 and ∼1 MV/cm after an optimum period of plasma exposure. Our infrared measurement confirms that the plasma energy creates many CC double bonds in the polymer chain while removing some of CF bonds, which are responsible for ferroelectric polarization. Nevertheless, the strengthened polymer can incorporate higher applied field, thereby aligning electric dipoles much better.

Original languageEnglish
Article number162911
JournalApplied Physics Letters
Volume97
Issue number16
DOIs
Publication statusPublished - 2010 Oct 18

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this