Field-dependent charge trapping analysis of ONO inter-poly dielectrics for NAND flash memory applications

Pyung Moon, Jun Yeong Lim, Tae Un Youn, Sung Kye Park, Ilgu Yun

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The effect of the operation voltage on the leakage current of SiO 2/Si3N4/SiO2 (ONO) stack is investigated which is used for the inter-poly dielectric (IPD) of the floating gate (FG) type NAND flash memory. In this work, the field dependent charge trapping mechanism of ONO stack and the effect of the trapped charges on the electrical characteristics are examined. The leakage current density-electric field (J-E) and the capacitance-voltage (C-V) characteristics are measured for various test samples of ONO stack by varying the voltage sweep ranges. The charge trapping/detrapping mechanisms of ONO stack are observed as the range of the applied sweep voltage is increased and then decreased to a given voltage, which is corresponding to the given electric field. The numbers of trapped and detrapped charges are extracted from the difference of J-E curves using the same recursive voltage sweeps and the effects on the electrical characteristics of ONO stack are demonstrated. Moreover, the dominant trapping layer is also investigated by varying the thickness of ONO stack.

Original languageEnglish
Pages (from-to)51-55
Number of pages5
JournalSolid-State Electronics
Volume94
DOIs
Publication statusPublished - 2014 Apr 1

Fingerprint

Charge trapping
Flash memory
flash
trapping
Electric potential
electric potential
Leakage currents
leakage
Electric fields
electric fields
capacitance-voltage characteristics
floating
Capacitance
Current density
current density
curves

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Materials Chemistry
  • Electrical and Electronic Engineering

Cite this

Moon, Pyung ; Lim, Jun Yeong ; Youn, Tae Un ; Park, Sung Kye ; Yun, Ilgu. / Field-dependent charge trapping analysis of ONO inter-poly dielectrics for NAND flash memory applications. In: Solid-State Electronics. 2014 ; Vol. 94. pp. 51-55.
@article{e36d872f47e04d7181793ffec231c5dd,
title = "Field-dependent charge trapping analysis of ONO inter-poly dielectrics for NAND flash memory applications",
abstract = "The effect of the operation voltage on the leakage current of SiO 2/Si3N4/SiO2 (ONO) stack is investigated which is used for the inter-poly dielectric (IPD) of the floating gate (FG) type NAND flash memory. In this work, the field dependent charge trapping mechanism of ONO stack and the effect of the trapped charges on the electrical characteristics are examined. The leakage current density-electric field (J-E) and the capacitance-voltage (C-V) characteristics are measured for various test samples of ONO stack by varying the voltage sweep ranges. The charge trapping/detrapping mechanisms of ONO stack are observed as the range of the applied sweep voltage is increased and then decreased to a given voltage, which is corresponding to the given electric field. The numbers of trapped and detrapped charges are extracted from the difference of J-E curves using the same recursive voltage sweeps and the effects on the electrical characteristics of ONO stack are demonstrated. Moreover, the dominant trapping layer is also investigated by varying the thickness of ONO stack.",
author = "Pyung Moon and Lim, {Jun Yeong} and Youn, {Tae Un} and Park, {Sung Kye} and Ilgu Yun",
year = "2014",
month = "4",
day = "1",
doi = "10.1016/j.sse.2014.02.007",
language = "English",
volume = "94",
pages = "51--55",
journal = "Solid-State Electronics",
issn = "0038-1101",
publisher = "Elsevier Limited",

}

Field-dependent charge trapping analysis of ONO inter-poly dielectrics for NAND flash memory applications. / Moon, Pyung; Lim, Jun Yeong; Youn, Tae Un; Park, Sung Kye; Yun, Ilgu.

In: Solid-State Electronics, Vol. 94, 01.04.2014, p. 51-55.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Field-dependent charge trapping analysis of ONO inter-poly dielectrics for NAND flash memory applications

AU - Moon, Pyung

AU - Lim, Jun Yeong

AU - Youn, Tae Un

AU - Park, Sung Kye

AU - Yun, Ilgu

PY - 2014/4/1

Y1 - 2014/4/1

N2 - The effect of the operation voltage on the leakage current of SiO 2/Si3N4/SiO2 (ONO) stack is investigated which is used for the inter-poly dielectric (IPD) of the floating gate (FG) type NAND flash memory. In this work, the field dependent charge trapping mechanism of ONO stack and the effect of the trapped charges on the electrical characteristics are examined. The leakage current density-electric field (J-E) and the capacitance-voltage (C-V) characteristics are measured for various test samples of ONO stack by varying the voltage sweep ranges. The charge trapping/detrapping mechanisms of ONO stack are observed as the range of the applied sweep voltage is increased and then decreased to a given voltage, which is corresponding to the given electric field. The numbers of trapped and detrapped charges are extracted from the difference of J-E curves using the same recursive voltage sweeps and the effects on the electrical characteristics of ONO stack are demonstrated. Moreover, the dominant trapping layer is also investigated by varying the thickness of ONO stack.

AB - The effect of the operation voltage on the leakage current of SiO 2/Si3N4/SiO2 (ONO) stack is investigated which is used for the inter-poly dielectric (IPD) of the floating gate (FG) type NAND flash memory. In this work, the field dependent charge trapping mechanism of ONO stack and the effect of the trapped charges on the electrical characteristics are examined. The leakage current density-electric field (J-E) and the capacitance-voltage (C-V) characteristics are measured for various test samples of ONO stack by varying the voltage sweep ranges. The charge trapping/detrapping mechanisms of ONO stack are observed as the range of the applied sweep voltage is increased and then decreased to a given voltage, which is corresponding to the given electric field. The numbers of trapped and detrapped charges are extracted from the difference of J-E curves using the same recursive voltage sweeps and the effects on the electrical characteristics of ONO stack are demonstrated. Moreover, the dominant trapping layer is also investigated by varying the thickness of ONO stack.

UR - http://www.scopus.com/inward/record.url?scp=84897744954&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84897744954&partnerID=8YFLogxK

U2 - 10.1016/j.sse.2014.02.007

DO - 10.1016/j.sse.2014.02.007

M3 - Article

VL - 94

SP - 51

EP - 55

JO - Solid-State Electronics

JF - Solid-State Electronics

SN - 0038-1101

ER -