Fluorinated low-viscosity copolymer with enhanced release property for roll-to-plate UV nanoimprint lithography

Su Bong Lee, Seungmuk Ji, Jun Young Lee, Jihye Lee, Jong Souk Yeo

Research output: Contribution to journalArticle

Abstract

A new fluorinated low-viscosity copolymer resin with enhanced release properties has been developed to provide higher fidelity for roll-based ultraviolet (UV) nanoimprint lithography (NIL) and simplify the process. The properties are optimized by blending (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl) oxirane (EP-F8) and 1,4-butanediol divinyl ether (BDDVE) with 3,4-epoxycyclohexylmethyl-3,4-epoxy cyclohexane carboxylate. The cured resin renders the hydrophobicity and allows demolding from the stamp mold without an anti-stick layer (ASL), as further verified by the contact angle and the work of adhesion measurements. Due to the addition of BDDVE, our resin also has much lower viscosity compared to commercially available low-viscosity resins. These properties enable the transfer of high-density dot patterns by roll-to-plate (R2P) UV NIL in the newly developed resin without adding solvent or coating it with an ASL. These results demonstrate that our resin is a good option for high-quality, low-cost R2P UV NIL, as its use eliminates several steps in the imprinting process, making it applicable to the scalable fabrication of flexible devices.

Original languageEnglish
Number of pages1
JournalNanotechnology
Volume30
Issue number50
DOIs
Publication statusPublished - 2019 Dec 13

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Nanoimprint lithography
Copolymers
Resins
Viscosity
Ethers
Butylene Glycols
Ethylene Oxide
Hydrophobicity
Cyclohexane
Contact angle
Adhesion
Fabrication
Coatings
Costs

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

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abstract = "A new fluorinated low-viscosity copolymer resin with enhanced release properties has been developed to provide higher fidelity for roll-based ultraviolet (UV) nanoimprint lithography (NIL) and simplify the process. The properties are optimized by blending (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl) oxirane (EP-F8) and 1,4-butanediol divinyl ether (BDDVE) with 3,4-epoxycyclohexylmethyl-3,4-epoxy cyclohexane carboxylate. The cured resin renders the hydrophobicity and allows demolding from the stamp mold without an anti-stick layer (ASL), as further verified by the contact angle and the work of adhesion measurements. Due to the addition of BDDVE, our resin also has much lower viscosity compared to commercially available low-viscosity resins. These properties enable the transfer of high-density dot patterns by roll-to-plate (R2P) UV NIL in the newly developed resin without adding solvent or coating it with an ASL. These results demonstrate that our resin is a good option for high-quality, low-cost R2P UV NIL, as its use eliminates several steps in the imprinting process, making it applicable to the scalable fabrication of flexible devices.",
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Fluorinated low-viscosity copolymer with enhanced release property for roll-to-plate UV nanoimprint lithography. / Lee, Su Bong; Ji, Seungmuk; Lee, Jun Young; Lee, Jihye; Yeo, Jong Souk.

In: Nanotechnology, Vol. 30, No. 50, 13.12.2019.

Research output: Contribution to journalArticle

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