Formation of low-resistance ohmic contacts between carbon nanotube and metal electrodes by a rapid thermal annealing method

Jeong O. Lee, C. Park, Ju Jin Kim, Jinhee Kim, Jong Wan Park, Kyung Hwa Yoo

Research output: Contribution to journalArticle

155 Citations (Scopus)

Abstract

The contact resistance between a carbon nanotube and metal electrodes decreases by several orders of magnitude and becomes long-term stable when the nanotube contacted by Ti-Au electrodes was annealed by a rapid thermal annealing method at 600-800°C for 30 s. The contact resistances of the annealed samples are in the range 0.5-50 kΩ at room temperature, depending on the electrical properties of the nanotube. The short and relatively low-temperature annealing process enables us to make a surface Ti-nanotube contact suitable for electrical measurements. For the samples with relatively low contact resistances (0.5-5 kΩ) at room temperature, the contact resistance remained constant or decreased slightly as the temperature was lowered. Those with a relatively high contact resistance (5-50 kΩ), on the other hand, showed increasing contact resistance with a lowering of the temperature.

Original languageEnglish
Pages (from-to)1953-1956
Number of pages4
JournalJournal of Physics D: Applied Physics
Volume33
Issue number16
DOIs
Publication statusPublished - 2000 Aug 21

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Formation of low-resistance ohmic contacts between carbon nanotube and metal electrodes by a rapid thermal annealing method'. Together they form a unique fingerprint.

  • Cite this