Formation of low-resistance ohmic contacts between carbon nanotube and metal electrodes by a rapid thermal annealing method

Jeong O. Lee, C. Park, Ju Jin Kim, Jinhee Kim, Jong Wan Park, Kyung Hwa Yoo

Research output: Contribution to journalArticle

152 Citations (Scopus)

Abstract

The contact resistance between a carbon nanotube and metal electrodes decreases by several orders of magnitude and becomes long-term stable when the nanotube contacted by Ti-Au electrodes was annealed by a rapid thermal annealing method at 600-800°C for 30 s. The contact resistances of the annealed samples are in the range 0.5-50 kΩ at room temperature, depending on the electrical properties of the nanotube. The short and relatively low-temperature annealing process enables us to make a surface Ti-nanotube contact suitable for electrical measurements. For the samples with relatively low contact resistances (0.5-5 kΩ) at room temperature, the contact resistance remained constant or decreased slightly as the temperature was lowered. Those with a relatively high contact resistance (5-50 kΩ), on the other hand, showed increasing contact resistance with a lowering of the temperature.

Original languageEnglish
Pages (from-to)1953-1956
Number of pages4
JournalJournal of Physics D: Applied Physics
Volume33
Issue number16
DOIs
Publication statusPublished - 2000 Aug 21

Fingerprint

Carbon Nanotubes
Ohmic contacts
Rapid thermal annealing
low resistance
Contact resistance
contact resistance
electric contacts
Carbon nanotubes
Metals
carbon nanotubes
Electrodes
annealing
electrodes
metals
Nanotubes
nanotubes
Temperature
room temperature
electrical measurement
Electric properties

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

Cite this

Lee, Jeong O. ; Park, C. ; Kim, Ju Jin ; Kim, Jinhee ; Park, Jong Wan ; Yoo, Kyung Hwa. / Formation of low-resistance ohmic contacts between carbon nanotube and metal electrodes by a rapid thermal annealing method. In: Journal of Physics D: Applied Physics. 2000 ; Vol. 33, No. 16. pp. 1953-1956.
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Formation of low-resistance ohmic contacts between carbon nanotube and metal electrodes by a rapid thermal annealing method. / Lee, Jeong O.; Park, C.; Kim, Ju Jin; Kim, Jinhee; Park, Jong Wan; Yoo, Kyung Hwa.

In: Journal of Physics D: Applied Physics, Vol. 33, No. 16, 21.08.2000, p. 1953-1956.

Research output: Contribution to journalArticle

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T1 - Formation of low-resistance ohmic contacts between carbon nanotube and metal electrodes by a rapid thermal annealing method

AU - Lee, Jeong O.

AU - Park, C.

AU - Kim, Ju Jin

AU - Kim, Jinhee

AU - Park, Jong Wan

AU - Yoo, Kyung Hwa

PY - 2000/8/21

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AB - The contact resistance between a carbon nanotube and metal electrodes decreases by several orders of magnitude and becomes long-term stable when the nanotube contacted by Ti-Au electrodes was annealed by a rapid thermal annealing method at 600-800°C for 30 s. The contact resistances of the annealed samples are in the range 0.5-50 kΩ at room temperature, depending on the electrical properties of the nanotube. The short and relatively low-temperature annealing process enables us to make a surface Ti-nanotube contact suitable for electrical measurements. For the samples with relatively low contact resistances (0.5-5 kΩ) at room temperature, the contact resistance remained constant or decreased slightly as the temperature was lowered. Those with a relatively high contact resistance (5-50 kΩ), on the other hand, showed increasing contact resistance with a lowering of the temperature.

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