A fully micromachined finite-ground coplanar (FGC) line-to-waveguide transition for W-band applications has been designed, fabricated, and tested. The transition utilizes a printed E-plane probe, inserted into the broad sidewall of a micromachined waveguide. This type of transition plays an important role in many applications where coupling between the popular FGC line and a waveguide is required. Excellent performance across the entire W-band of such a transition is presented in this paper. The investigated waveguide, micromachined in silicon using the deep reactive ion etching technique, demonstrates its potential as an alternative to costly conventional waveguides at high frequencies. A similar transition with a micromachined waveguide formed via bulk micromachining using a wet etchant is also demonstrated. The free-standing probe utilized in this second transition proves the potential of such transitions to be applicable well into the submillimeter and terahertz range.
|Number of pages||7|
|Journal||IEEE Transactions on Microwave Theory and Techniques|
|Publication status||Published - 2004 Mar|
Bibliographical noteFunding Information:
Manuscript received July 11, 2003; revised October 9, 2003. This work was supported by the Defense Advanced Research Projects Agency under the Solid State THz Sources Grant N00014-99-1-0915.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering