Fully micromachined finite-ground coplanar line-to-waveguide transitions for W-band applications

Yongshik Lee, James P. Becker, Jack R. East, Linda P.B. Katehi

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

A fully micromachined finite-ground coplanar (FGC) line-to-waveguide transition for W-band applications has been designed, fabricated, and tested. The transition utilizes a printed E-plane probe, inserted into the broad sidewall of a micromachined waveguide. This type of transition plays an important role in many applications where coupling between the popular FGC line and a waveguide is required. Excellent performance across the entire W-band of such a transition is presented in this paper. The investigated waveguide, micromachined in silicon using the deep reactive ion etching technique, demonstrates its potential as an alternative to costly conventional waveguides at high frequencies. A similar transition with a micromachined waveguide formed via bulk micromachining using a wet etchant is also demonstrated. The free-standing probe utilized in this second transition proves the potential of such transitions to be applicable well into the submillimeter and terahertz range.

Original languageEnglish
Pages (from-to)1001-1007
Number of pages7
JournalIEEE Transactions on Microwave Theory and Techniques
Volume52
Issue number3
DOIs
Publication statusPublished - 2004 Mar 1

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Telephone lines
Antenna grounds
Waveguides
waveguides
Reactive ion etching
Micromachining
etchants
probes
micromachining
Silicon
etching
silicon

All Science Journal Classification (ASJC) codes

  • Radiation
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

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abstract = "A fully micromachined finite-ground coplanar (FGC) line-to-waveguide transition for W-band applications has been designed, fabricated, and tested. The transition utilizes a printed E-plane probe, inserted into the broad sidewall of a micromachined waveguide. This type of transition plays an important role in many applications where coupling between the popular FGC line and a waveguide is required. Excellent performance across the entire W-band of such a transition is presented in this paper. The investigated waveguide, micromachined in silicon using the deep reactive ion etching technique, demonstrates its potential as an alternative to costly conventional waveguides at high frequencies. A similar transition with a micromachined waveguide formed via bulk micromachining using a wet etchant is also demonstrated. The free-standing probe utilized in this second transition proves the potential of such transitions to be applicable well into the submillimeter and terahertz range.",
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Fully micromachined finite-ground coplanar line-to-waveguide transitions for W-band applications. / Lee, Yongshik; Becker, James P.; East, Jack R.; Katehi, Linda P.B.

In: IEEE Transactions on Microwave Theory and Techniques, Vol. 52, No. 3, 01.03.2004, p. 1001-1007.

Research output: Contribution to journalArticle

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