Fundamental investigation of the wear progression of silicon atomic force microscope probes

Koo Hyun Chung, Yong Ha Lee, Hae Jin Kim, Dae Eun Kim

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Atomic force microscopy (AFM) is a key instrument in nanotechnology; however, AFM probe wear is a critical concern with AFM-based technologies. In this work, the wear progression of silicon AFM probes with different radii was thoroughly explored under various normal forces and sliding speeds. The results showed that the initial wear coefficient increased as the normal force increased. However, after a certain sliding distance, the wear coefficient was stable due to the flattening of the probe even with increasing normal force. It was also observed that the wear coefficient decreased with increasing probe radius and the wear of the probe increased as the sliding speed increased. From the overall results, it was concluded that the contact pressure plays a significant role in wear progression and may be responsible for a lower wear coefficient even with increasing adhesion forces due to wear. The wear rate was found to have an exponential dependence on contact stress, as proposed in recent literatures.

Original languageEnglish
Pages (from-to)315-325
Number of pages11
JournalTribology Letters
Volume52
Issue number2
DOIs
Publication statusPublished - 2013 Nov 1

Fingerprint

Silicon
progressions
Microscopes
microscopes
Wear of materials
probes
silicon
Atomic force microscopy
atomic force microscopy
sliding
coefficients
radii
flattening
nanotechnology
Nanotechnology
adhesion
Adhesion

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Chung, Koo Hyun ; Lee, Yong Ha ; Kim, Hae Jin ; Kim, Dae Eun. / Fundamental investigation of the wear progression of silicon atomic force microscope probes. In: Tribology Letters. 2013 ; Vol. 52, No. 2. pp. 315-325.
@article{9b57e753aabe4a7b8a01971b5f720fcf,
title = "Fundamental investigation of the wear progression of silicon atomic force microscope probes",
abstract = "Atomic force microscopy (AFM) is a key instrument in nanotechnology; however, AFM probe wear is a critical concern with AFM-based technologies. In this work, the wear progression of silicon AFM probes with different radii was thoroughly explored under various normal forces and sliding speeds. The results showed that the initial wear coefficient increased as the normal force increased. However, after a certain sliding distance, the wear coefficient was stable due to the flattening of the probe even with increasing normal force. It was also observed that the wear coefficient decreased with increasing probe radius and the wear of the probe increased as the sliding speed increased. From the overall results, it was concluded that the contact pressure plays a significant role in wear progression and may be responsible for a lower wear coefficient even with increasing adhesion forces due to wear. The wear rate was found to have an exponential dependence on contact stress, as proposed in recent literatures.",
author = "Chung, {Koo Hyun} and Lee, {Yong Ha} and Kim, {Hae Jin} and Kim, {Dae Eun}",
year = "2013",
month = "11",
day = "1",
doi = "10.1007/s11249-013-0217-8",
language = "English",
volume = "52",
pages = "315--325",
journal = "Tribology Letters",
issn = "1023-8883",
publisher = "Springer New York",
number = "2",

}

Fundamental investigation of the wear progression of silicon atomic force microscope probes. / Chung, Koo Hyun; Lee, Yong Ha; Kim, Hae Jin; Kim, Dae Eun.

In: Tribology Letters, Vol. 52, No. 2, 01.11.2013, p. 315-325.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Fundamental investigation of the wear progression of silicon atomic force microscope probes

AU - Chung, Koo Hyun

AU - Lee, Yong Ha

AU - Kim, Hae Jin

AU - Kim, Dae Eun

PY - 2013/11/1

Y1 - 2013/11/1

N2 - Atomic force microscopy (AFM) is a key instrument in nanotechnology; however, AFM probe wear is a critical concern with AFM-based technologies. In this work, the wear progression of silicon AFM probes with different radii was thoroughly explored under various normal forces and sliding speeds. The results showed that the initial wear coefficient increased as the normal force increased. However, after a certain sliding distance, the wear coefficient was stable due to the flattening of the probe even with increasing normal force. It was also observed that the wear coefficient decreased with increasing probe radius and the wear of the probe increased as the sliding speed increased. From the overall results, it was concluded that the contact pressure plays a significant role in wear progression and may be responsible for a lower wear coefficient even with increasing adhesion forces due to wear. The wear rate was found to have an exponential dependence on contact stress, as proposed in recent literatures.

AB - Atomic force microscopy (AFM) is a key instrument in nanotechnology; however, AFM probe wear is a critical concern with AFM-based technologies. In this work, the wear progression of silicon AFM probes with different radii was thoroughly explored under various normal forces and sliding speeds. The results showed that the initial wear coefficient increased as the normal force increased. However, after a certain sliding distance, the wear coefficient was stable due to the flattening of the probe even with increasing normal force. It was also observed that the wear coefficient decreased with increasing probe radius and the wear of the probe increased as the sliding speed increased. From the overall results, it was concluded that the contact pressure plays a significant role in wear progression and may be responsible for a lower wear coefficient even with increasing adhesion forces due to wear. The wear rate was found to have an exponential dependence on contact stress, as proposed in recent literatures.

UR - http://www.scopus.com/inward/record.url?scp=84890059511&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84890059511&partnerID=8YFLogxK

U2 - 10.1007/s11249-013-0217-8

DO - 10.1007/s11249-013-0217-8

M3 - Article

AN - SCOPUS:84890059511

VL - 52

SP - 315

EP - 325

JO - Tribology Letters

JF - Tribology Letters

SN - 1023-8883

IS - 2

ER -