Generalized scanning beam interference lithography system for patterning gratings with variable period progressions

G. S. Pati, R. K. Heilmann, P. T. Konkola, C. Joo, C. G. Chen, E. Murphy

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

An overview is given on the demonstration of the concept of an interference lithography system with a general patterning ability. A fringe-locking scheme for phase control in the system that can enable high-uniformity and low-distortion patterning for future applications is introduced. Issues related to lens aberration and device properties are also discussed in the context of future system development.

Original languageEnglish
Pages (from-to)2617-2621
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number6
DOIs
Publication statusPublished - 2002 Nov 1

Fingerprint

Phase control
phase control
Aberrations
progressions
Lithography
locking
aberration
Lenses
Demonstrations
lithography
lenses
gratings
Scanning
interference
scanning

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

@article{6422ea7a0b3c433487a35141114919ba,
title = "Generalized scanning beam interference lithography system for patterning gratings with variable period progressions",
abstract = "An overview is given on the demonstration of the concept of an interference lithography system with a general patterning ability. A fringe-locking scheme for phase control in the system that can enable high-uniformity and low-distortion patterning for future applications is introduced. Issues related to lens aberration and device properties are also discussed in the context of future system development.",
author = "Pati, {G. S.} and Heilmann, {R. K.} and Konkola, {P. T.} and C. Joo and Chen, {C. G.} and E. Murphy",
year = "2002",
month = "11",
day = "1",
doi = "10.1116/1.1520563",
language = "English",
volume = "20",
pages = "2617--2621",
journal = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "6",

}

Generalized scanning beam interference lithography system for patterning gratings with variable period progressions. / Pati, G. S.; Heilmann, R. K.; Konkola, P. T.; Joo, C.; Chen, C. G.; Murphy, E.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 20, No. 6, 01.11.2002, p. 2617-2621.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Generalized scanning beam interference lithography system for patterning gratings with variable period progressions

AU - Pati, G. S.

AU - Heilmann, R. K.

AU - Konkola, P. T.

AU - Joo, C.

AU - Chen, C. G.

AU - Murphy, E.

PY - 2002/11/1

Y1 - 2002/11/1

N2 - An overview is given on the demonstration of the concept of an interference lithography system with a general patterning ability. A fringe-locking scheme for phase control in the system that can enable high-uniformity and low-distortion patterning for future applications is introduced. Issues related to lens aberration and device properties are also discussed in the context of future system development.

AB - An overview is given on the demonstration of the concept of an interference lithography system with a general patterning ability. A fringe-locking scheme for phase control in the system that can enable high-uniformity and low-distortion patterning for future applications is introduced. Issues related to lens aberration and device properties are also discussed in the context of future system development.

UR - http://www.scopus.com/inward/record.url?scp=0036883128&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036883128&partnerID=8YFLogxK

U2 - 10.1116/1.1520563

DO - 10.1116/1.1520563

M3 - Article

VL - 20

SP - 2617

EP - 2621

JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

SN - 1071-1023

IS - 6

ER -