Generalized scanning beam interference lithography system for patterning gratings with variable period progressions

G. S. Pati; R. K. Heilmann; P. T. Konkola; C. Joo; C. G. Chen; E. Murphy

doi:10.1116/1.1520563

Generalized scanning beam interference lithography system for patterning gratings with variable period progressions

G. S. Pati, R. K. Heilmann, P. T. Konkola, C. Joo, C. G. Chen, E. Murphy

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

An overview is given on the demonstration of the concept of an interference lithography system with a general patterning ability. A fringe-locking scheme for phase control in the system that can enable high-uniformity and low-distortion patterning for future applications is introduced. Issues related to lens aberration and device properties are also discussed in the context of future system development.

Original language	English
Pages (from-to)	2617-2621
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	20
Issue number	6
DOIs	https://doi.org/10.1116/1.1520563
Publication status	Published - 2002 Nov

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1520563

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abstract = "An overview is given on the demonstration of the concept of an interference lithography system with a general patterning ability. A fringe-locking scheme for phase control in the system that can enable high-uniformity and low-distortion patterning for future applications is introduced. Issues related to lens aberration and device properties are also discussed in the context of future system development.",

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AU - Joo, C.

AU - Chen, C. G.

AU - Murphy, E.

PY - 2002/11

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N2 - An overview is given on the demonstration of the concept of an interference lithography system with a general patterning ability. A fringe-locking scheme for phase control in the system that can enable high-uniformity and low-distortion patterning for future applications is introduced. Issues related to lens aberration and device properties are also discussed in the context of future system development.

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ER -

Generalized scanning beam interference lithography system for patterning gratings with variable period progressions

Abstract

All Science Journal Classification (ASJC) codes

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