An overview is given on the demonstration of the concept of an interference lithography system with a general patterning ability. A fringe-locking scheme for phase control in the system that can enable high-uniformity and low-distortion patterning for future applications is introduced. Issues related to lens aberration and device properties are also discussed in the context of future system development.
|Number of pages||5|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Publication status||Published - 2002 Nov 1|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering