Generalized scanning beam interference lithography system for patterning gratings with variable period progressions

G. S. Pati, R. K. Heilmann, P. T. Konkola, C. Joo, C. G. Chen, E. Murphy

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

An overview is given on the demonstration of the concept of an interference lithography system with a general patterning ability. A fringe-locking scheme for phase control in the system that can enable high-uniformity and low-distortion patterning for future applications is introduced. Issues related to lens aberration and device properties are also discussed in the context of future system development.

Original languageEnglish
Pages (from-to)2617-2621
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number6
DOIs
Publication statusPublished - 2002 Nov 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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