Growth and mechanism of one-dimensional Al 2O 3 nanostructures grown by chemical vapor deposition from an Al powder source

Si Jung Park, Yoo Youl Choi, Jun Gyu Kim, Doo Jin Choi

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)


Alumina (Al 2O 3) nanostructures were grown in a horizontal Al 2O 3 tube furnace by chemical vapor deposition (CVD) using an aluminum (Al) powder source without catalysts at temperatures ranging from 1100 to 1400 °C and pressures ranging from 0.01 to 53.32 kPa. As the temperature and pressure were increased, the nanostructure size increased and in particular, increasing pressure resulted in various changes in morphology. Here we present a morphology diagram of the one-dimensional Al 2O 3 nanostructure growth to illustrate different growth features at various temperatures and pressures. Moreover, we suggest that the Al 2O 3 nanostructure deposition mechanism was affected by the liquid source droplet and film morphology as the temperature and pressure changed in the absence of catalysts.

Original languageEnglish
Pages (from-to)189-194
Number of pages6
JournalJournal of Crystal Growth
Issue number1
Publication statusPublished - 2012 Dec 15

Bibliographical note

Funding Information:
This work was supported by DAPA and ADD, Republic of Korea .

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry


Dive into the research topics of 'Growth and mechanism of one-dimensional Al <sub>2</sub>O <sub>3</sub> nanostructures grown by chemical vapor deposition from an Al powder source'. Together they form a unique fingerprint.

Cite this