Growth and mechanism of one-dimensional Al 2O 3 nanostructures grown by chemical vapor deposition from an Al powder source

Si Jung Park, Yoo Youl Choi, Jun Gyu Kim, Doo Jin Choi

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Alumina (Al 2O 3) nanostructures were grown in a horizontal Al 2O 3 tube furnace by chemical vapor deposition (CVD) using an aluminum (Al) powder source without catalysts at temperatures ranging from 1100 to 1400 °C and pressures ranging from 0.01 to 53.32 kPa. As the temperature and pressure were increased, the nanostructure size increased and in particular, increasing pressure resulted in various changes in morphology. Here we present a morphology diagram of the one-dimensional Al 2O 3 nanostructure growth to illustrate different growth features at various temperatures and pressures. Moreover, we suggest that the Al 2O 3 nanostructure deposition mechanism was affected by the liquid source droplet and film morphology as the temperature and pressure changed in the absence of catalysts.

Original languageEnglish
Pages (from-to)189-194
Number of pages6
JournalJournal of Crystal Growth
Volume361
Issue number1
DOIs
Publication statusPublished - 2012 Dec 15

Fingerprint

Aluminum
Powders
Chemical vapor deposition
Nanostructures
vapor deposition
aluminum
nanostructure growth
catalysts
Temperature
Catalysts
temperature
Aluminum Oxide
furnaces
Furnaces
Alumina
aluminum oxides
diagrams
tubes
Liquids
liquids

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Cite this

@article{bfb3bbbb8b9b4d9397ced3daae933c76,
title = "Growth and mechanism of one-dimensional Al 2O 3 nanostructures grown by chemical vapor deposition from an Al powder source",
abstract = "Alumina (Al 2O 3) nanostructures were grown in a horizontal Al 2O 3 tube furnace by chemical vapor deposition (CVD) using an aluminum (Al) powder source without catalysts at temperatures ranging from 1100 to 1400 °C and pressures ranging from 0.01 to 53.32 kPa. As the temperature and pressure were increased, the nanostructure size increased and in particular, increasing pressure resulted in various changes in morphology. Here we present a morphology diagram of the one-dimensional Al 2O 3 nanostructure growth to illustrate different growth features at various temperatures and pressures. Moreover, we suggest that the Al 2O 3 nanostructure deposition mechanism was affected by the liquid source droplet and film morphology as the temperature and pressure changed in the absence of catalysts.",
author = "Park, {Si Jung} and Choi, {Yoo Youl} and Kim, {Jun Gyu} and Choi, {Doo Jin}",
year = "2012",
month = "12",
day = "15",
doi = "10.1016/j.jcrysgro.2012.09.038",
language = "English",
volume = "361",
pages = "189--194",
journal = "Journal of Crystal Growth",
issn = "0022-0248",
publisher = "Elsevier",
number = "1",

}

Growth and mechanism of one-dimensional Al 2O 3 nanostructures grown by chemical vapor deposition from an Al powder source. / Park, Si Jung; Choi, Yoo Youl; Kim, Jun Gyu; Choi, Doo Jin.

In: Journal of Crystal Growth, Vol. 361, No. 1, 15.12.2012, p. 189-194.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Growth and mechanism of one-dimensional Al 2O 3 nanostructures grown by chemical vapor deposition from an Al powder source

AU - Park, Si Jung

AU - Choi, Yoo Youl

AU - Kim, Jun Gyu

AU - Choi, Doo Jin

PY - 2012/12/15

Y1 - 2012/12/15

N2 - Alumina (Al 2O 3) nanostructures were grown in a horizontal Al 2O 3 tube furnace by chemical vapor deposition (CVD) using an aluminum (Al) powder source without catalysts at temperatures ranging from 1100 to 1400 °C and pressures ranging from 0.01 to 53.32 kPa. As the temperature and pressure were increased, the nanostructure size increased and in particular, increasing pressure resulted in various changes in morphology. Here we present a morphology diagram of the one-dimensional Al 2O 3 nanostructure growth to illustrate different growth features at various temperatures and pressures. Moreover, we suggest that the Al 2O 3 nanostructure deposition mechanism was affected by the liquid source droplet and film morphology as the temperature and pressure changed in the absence of catalysts.

AB - Alumina (Al 2O 3) nanostructures were grown in a horizontal Al 2O 3 tube furnace by chemical vapor deposition (CVD) using an aluminum (Al) powder source without catalysts at temperatures ranging from 1100 to 1400 °C and pressures ranging from 0.01 to 53.32 kPa. As the temperature and pressure were increased, the nanostructure size increased and in particular, increasing pressure resulted in various changes in morphology. Here we present a morphology diagram of the one-dimensional Al 2O 3 nanostructure growth to illustrate different growth features at various temperatures and pressures. Moreover, we suggest that the Al 2O 3 nanostructure deposition mechanism was affected by the liquid source droplet and film morphology as the temperature and pressure changed in the absence of catalysts.

UR - http://www.scopus.com/inward/record.url?scp=84867608429&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84867608429&partnerID=8YFLogxK

U2 - 10.1016/j.jcrysgro.2012.09.038

DO - 10.1016/j.jcrysgro.2012.09.038

M3 - Article

VL - 361

SP - 189

EP - 194

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

SN - 0022-0248

IS - 1

ER -