Growth and physical properties of epitaxial metastable cubic TaN(001)

C. S. Shin; D. Gall; P. Desjardins; A. Vailionis; H. Kim; I. Petrov; J. E. Greene; M. Odén

doi:10.1063/1.125463

Growth and physical properties of epitaxial metastable cubic TaN(001)

C. S. Shin, D. Gall, P. Desjardins, A. Vailionis, H. Kim, I. Petrov, J. E. Greene, M. Odén

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

61 Citations (Scopus)

Abstract

We report the growth of epitaxial metastable B1 NaCl structure TaN(001) layers, The films were grown on MgO(001) at 600 °C by ultrahigh vacuum reactive magnetron sputter deposition in mixed Ar/N₂ discharges maintained at 20 mTorr (2.67 Pa). X-ray diffraction and transmission electron microscopy results establish the epitaxial relationship as cube-on-cube, (001)_TaN¶(001)_MgO with [100]_TaN¶[100]Mgo, while Rutherford backscattering spectroscopy shows that the layers are overstoichiometric with N/Ta=1.22±0.02. The room-temperature resistivity is 225 μΩ cm with a small negative temperature dependence between 20 and 400 K. The hardness and elastic modulus, as determined by nanoindentation measurements, are 30.8±0.9 and 457±16 GPa, respectively.

Original language	English
Pages (from-to)	3808-3810
Number of pages	3
Journal	Applied Physics Letters
Volume	75
Issue number	24
DOIs	https://doi.org/10.1063/1.125463
Publication status	Published - 1999 Dec 13

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.125463

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title = "Growth and physical properties of epitaxial metastable cubic TaN(001)",

abstract = "We report the growth of epitaxial metastable B1 NaCl structure TaN(001) layers, The films were grown on MgO(001) at 600 °C by ultrahigh vacuum reactive magnetron sputter deposition in mixed Ar/N2 discharges maintained at 20 mTorr (2.67 Pa). X-ray diffraction and transmission electron microscopy results establish the epitaxial relationship as cube-on-cube, (001)TaN¶(001)MgO with [100]TaN¶[100]Mgo, while Rutherford backscattering spectroscopy shows that the layers are overstoichiometric with N/Ta=1.22±0.02. The room-temperature resistivity is 225 μΩ cm with a small negative temperature dependence between 20 and 400 K. The hardness and elastic modulus, as determined by nanoindentation measurements, are 30.8±0.9 and 457±16 GPa, respectively.",

author = "Shin, {C. S.} and D. Gall and P. Desjardins and A. Vailionis and H. Kim and I. Petrov and Greene, {J. E.} and M. Od{\'e}n",

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T1 - Growth and physical properties of epitaxial metastable cubic TaN(001)

AU - Shin, C. S.

AU - Gall, D.

AU - Desjardins, P.

AU - Vailionis, A.

AU - Kim, H.

AU - Petrov, I.

AU - Greene, J. E.

AU - Odén, M.

PY - 1999/12/13

Y1 - 1999/12/13

N2 - We report the growth of epitaxial metastable B1 NaCl structure TaN(001) layers, The films were grown on MgO(001) at 600 °C by ultrahigh vacuum reactive magnetron sputter deposition in mixed Ar/N2 discharges maintained at 20 mTorr (2.67 Pa). X-ray diffraction and transmission electron microscopy results establish the epitaxial relationship as cube-on-cube, (001)TaN¶(001)MgO with [100]TaN¶[100]Mgo, while Rutherford backscattering spectroscopy shows that the layers are overstoichiometric with N/Ta=1.22±0.02. The room-temperature resistivity is 225 μΩ cm with a small negative temperature dependence between 20 and 400 K. The hardness and elastic modulus, as determined by nanoindentation measurements, are 30.8±0.9 and 457±16 GPa, respectively.

AB - We report the growth of epitaxial metastable B1 NaCl structure TaN(001) layers, The films were grown on MgO(001) at 600 °C by ultrahigh vacuum reactive magnetron sputter deposition in mixed Ar/N2 discharges maintained at 20 mTorr (2.67 Pa). X-ray diffraction and transmission electron microscopy results establish the epitaxial relationship as cube-on-cube, (001)TaN¶(001)MgO with [100]TaN¶[100]Mgo, while Rutherford backscattering spectroscopy shows that the layers are overstoichiometric with N/Ta=1.22±0.02. The room-temperature resistivity is 225 μΩ cm with a small negative temperature dependence between 20 and 400 K. The hardness and elastic modulus, as determined by nanoindentation measurements, are 30.8±0.9 and 457±16 GPa, respectively.

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Growth and physical properties of epitaxial metastable cubic TaN(001)

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