Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Hanearl Jung, Woo Hee Kim, Il Kwon Oh, Chang Wan Lee, Clement Lansalot-Matras, Su Jeong Lee, Jae Min Myoung, Han Bo Ram Lee, Hyungjun Kim

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15 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds