Growth of γ-Al2O3 thin films on silicon by low pressure metal-organic chemical vapour deposition

S. S. Yom, W. N. Kang, Y. S. Yoon, J. I. Lee, D. J. Choi, T. W. Kim, K. Y. Seo, P. H. Hur, C. Y. Kim

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22 Citations (Scopus)


Metal-organic chemical vapour deposition of Al2O3 using aluminium isopropoxide (Al(OC3H7)3) and nitrous oxide (N2O) via thermal pyrolysis was investigated with the goal of producing high quality Al2O3p-Si(100) interfaces. From the X-ray diffraction analysis, the film was found to be a γ-Al2O3 heteroepitaxial film. The stoichiometry of the grown Al2O3 film was similar to that of sapphire observed from Auger electron spectroscopy. Room temperature capacitance-voltage measurements clearly reveal metal-insulator-semiconductor behaviour for samples with the Al2O3 insulator gate, and the interface state densities at the Al2O3p-Si heterointerface were approximately 1011 eV-1 cm-2, at levels centred in the silicon energy gap.

Original languageEnglish
Pages (from-to)72-75
Number of pages4
JournalThin Solid Films
Issue number1
Publication statusPublished - 1992 May 29

Bibliographical note

Funding Information:
One of us (S. S. Yore) is grateful to M. S. Kim and Y. Kim for technical assistance of the MOCVD growth system design. The work at Kwangwoon University was supported in part by the Korean Ministry of Education.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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