Growth of epitaxial γ-Al2O3(111) films using an oxidized Si(111) substrate

S. W. Whangbo, Y. K. Choi, K. B. Chung, Y. D. Chung, W. S. Koh, H. K. Jang, H. W. Yeom, K. Jeoung, S. K. Kang, D. H. Ko, C. N. Whang

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