Hf-aluminate films with and without an interfacial layer during growth and postannealing structural and electrical characteristics

K. B. Chung, H. S. Chang, S. H. Lee, C. N. Whang, D. H. Ko, H. Kim, D. W. Moon, M. H. Cho

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3 Citations (Scopus)

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Physics & Astronomy

Chemical Compounds

Engineering & Materials Science