Hierarchically open-porous nitrogen-incorporated carbon polyhedrons derived from metal-organic frameworks for improved CDI performance

Jiyoung Kim, Jeonghun Kim, Jung Ho Kim, Ho Seok Park

Research output: Contribution to journalArticlepeer-review

53 Citations (Scopus)

Abstract

Capacitive deionization (CDI) is considered as a simple, robust, and environmentally favorable technology for water treatment. High performance electrode materials beyond commercial activated carbons (AC) should be developed for the practical application of CDI. Herein, we demonstrate hierarchically open-porous nitrogen-incorporated activated nanoporous carbon polyhedron (A-NCP) derived from metal-organic frameworks (MOFs) for high performance CDI electrodes. Owing to the 3D morphology with open nanoporous surface, macroporous channels by interlinked polyhedron particles, and electric conductivity by doped nitrogen, A-NCP delivers a high desalination capacity of 24.4 mg/g with a low concentration of 100 mg/mL at 1.2 V, revealing faster kinetic performance than that of commercial AC in the batch-mode CDI. Varying operating conditions such as applied voltage, concentration, and feed rate of saline water in a single-pass experiment, high salt adsorption capacity and fast ion removal of A-NCP are obtained, achieving high position of CDI Ragone plot.

Original languageEnglish
Article number122996
JournalChemical Engineering Journal
Volume382
DOIs
Publication statusPublished - 2020 Feb 15

Bibliographical note

Funding Information:
This research was supported by both the Energy Technology Development Project (ETDP) funded by the Ministry of Trade, Industry, and Energy ( 20172410100150 ) and Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (no. 2017M2A2A6A01021187 & NRF-2017R1A6A3A11031355 ).

Publisher Copyright:
© 2019 Elsevier B.V.

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Environmental Chemistry
  • Chemical Engineering(all)
  • Industrial and Manufacturing Engineering

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