Abstract
We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.
| Original language | English |
|---|---|
| Title of host publication | Advances in Patterning Materials and Processes XXXIII |
| Editors | Todd R. Younkin, Christoph K. Hohle |
| Publisher | SPIE |
| ISBN (Electronic) | 9781510600140 |
| DOIs | |
| Publication status | Published - 2016 Jan 1 |
| Event | Advances in Patterning Materials and Processes XXXIII - San Jose, United States Duration: 2016 Feb 22 → 2016 Feb 25 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 9779 |
| ISSN (Print) | 0277-786X |
| ISSN (Electronic) | 1996-756X |
Other
| Other | Advances in Patterning Materials and Processes XXXIII |
|---|---|
| Country | United States |
| City | San Jose |
| Period | 16/2/22 → 16/2/25 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering
Cite this
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High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers. / Park, Sungmin; Jo, Seongjun; Lee, Yonghoon; Ryu, Chang Y.; Ryu, Du Yeol; Chun, Jun Sung.
Advances in Patterning Materials and Processes XXXIII. ed. / Todd R. Younkin; Christoph K. Hohle. SPIE, 2016. 977911 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9779).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers
AU - Park, Sungmin
AU - Jo, Seongjun
AU - Lee, Yonghoon
AU - Ryu, Chang Y.
AU - Ryu, Du Yeol
AU - Chun, Jun Sung
PY - 2016/1/1
Y1 - 2016/1/1
N2 - We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.
AB - We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.
UR - http://www.scopus.com/inward/record.url?scp=84974622894&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84974622894&partnerID=8YFLogxK
U2 - 10.1117/12.2221905
DO - 10.1117/12.2221905
M3 - Conference contribution
AN - SCOPUS:84974622894
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Patterning Materials and Processes XXXIII
A2 - Younkin, Todd R.
A2 - Hohle, Christoph K.
PB - SPIE
ER -