@inproceedings{35df28538fae4fbb8ba23303c4fc4d6e,
title = "High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers",
abstract = "We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.",
author = "Sungmin Park and Seongjun Jo and Yonghoon Lee and Ryu, {Chang Y.} and Ryu, {Du Yeol} and Chun, {Jun Sung}",
year = "2016",
month = jan,
day = "1",
doi = "10.1117/12.2221905",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Younkin, {Todd R.} and Hohle, {Christoph K.}",
booktitle = "Advances in Patterning Materials and Processes XXXIII",
address = "United States",
note = "Advances in Patterning Materials and Processes XXXIII ; Conference date: 22-02-2016 Through 25-02-2016",
}