High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers

Sungmin Park; Seongjun Jo; Yonghoon Lee; Chang Y. Ryu; Du Yeol Ryu; Jun Sung Chun

doi:10.1117/12.2221905

High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers

Sungmin Park, Seongjun Jo, Yonghoon Lee, Chang Y. Ryu, Du Yeol Ryu, Jun Sung Chun

Department of Chemical and Biomolecular Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.

Original language	English
Title of host publication	Advances in Patterning Materials and Processes XXXIII
Editors	Todd R. Younkin, Christoph K. Hohle
Publisher	SPIE
ISBN (Electronic)	9781510600140
DOIs	https://doi.org/10.1117/12.2221905
Publication status	Published - 2016
Event	Advances in Patterning Materials and Processes XXXIII - San Jose, United States Duration: 2016 Feb 22 → 2016 Feb 25

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	9779
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Other

Other	Advances in Patterning Materials and Processes XXXIII
Country/Territory	United States
City	San Jose
Period	16/2/22 → 16/2/25

Bibliographical note

Publisher Copyright:
© 2016 SPIE.

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.2221905

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Park, S., Jo, S., Lee, Y., Ryu, C. Y., Ryu, D. Y., & Chun, J. S. (2016). High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers. In T. R. Younkin, & C. K. Hohle (Eds.), Advances in Patterning Materials and Processes XXXIII [977911] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9779). SPIE. https://doi.org/10.1117/12.2221905

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title = "High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers",

abstract = "We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.",

author = "Sungmin Park and Seongjun Jo and Yonghoon Lee and Ryu, {Chang Y.} and Ryu, {Du Yeol} and Chun, {Jun Sung}",

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Park, S, Jo, S, Lee, Y, Ryu, CY, Ryu, DY & Chun, JS 2016, High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers. in TR Younkin & CK Hohle (eds), Advances in Patterning Materials and Processes XXXIII., 977911, Proceedings of SPIE - The International Society for Optical Engineering, vol. 9779, SPIE, Advances in Patterning Materials and Processes XXXIII, San Jose, United States, 16/2/22. https://doi.org/10.1117/12.2221905

High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers. / Park, Sungmin; Jo, Seongjun; Lee, Yonghoon et al.

Advances in Patterning Materials and Processes XXXIII. ed. / Todd R. Younkin; Christoph K. Hohle. SPIE, 2016. 977911 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9779).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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AU - Jo, Seongjun

AU - Lee, Yonghoon

AU - Ryu, Chang Y.

AU - Ryu, Du Yeol

AU - Chun, Jun Sung

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N2 - We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.

AB - We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.

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BT - Advances in Patterning Materials and Processes XXXIII

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ER -

High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers

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