High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers

Sungmin Park, Seongjun Jo, Yonghoon Lee, Chang Y. Ryu, Du Yeol Ryu, Jun Sung Chun

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.

Original languageEnglish
Title of host publicationAdvances in Patterning Materials and Processes XXXIII
EditorsTodd R. Younkin, Christoph K. Hohle
PublisherSPIE
ISBN (Electronic)9781510600140
DOIs
Publication statusPublished - 2016 Jan 1
EventAdvances in Patterning Materials and Processes XXXIII - San Jose, United States
Duration: 2016 Feb 222016 Feb 25

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9779
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherAdvances in Patterning Materials and Processes XXXIII
CountryUnited States
CitySan Jose
Period16/2/2216/2/25

Fingerprint

Block Copolymers
Chemical modification
acrylates
block copolymers
Block copolymers
Precursor
Trifluoroethanol
Nanolithography
Polydispersity
Fluorination
Weight Distribution
Anionic polymerization
fluorination
Self-assembly
controllability
Polymerization
Transmission Electron Microscopy
Molecular weight distribution
x ray scattering
n-butyl acrylate

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Park, S., Jo, S., Lee, Y., Ryu, C. Y., Ryu, D. Y., & Chun, J. S. (2016). High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers. In T. R. Younkin, & C. K. Hohle (Eds.), Advances in Patterning Materials and Processes XXXIII [977911] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9779). SPIE. https://doi.org/10.1117/12.2221905
Park, Sungmin ; Jo, Seongjun ; Lee, Yonghoon ; Ryu, Chang Y. ; Ryu, Du Yeol ; Chun, Jun Sung. / High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers. Advances in Patterning Materials and Processes XXXIII. editor / Todd R. Younkin ; Christoph K. Hohle. SPIE, 2016. (Proceedings of SPIE - The International Society for Optical Engineering).
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Park, S, Jo, S, Lee, Y, Ryu, CY, Ryu, DY & Chun, JS 2016, High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers. in TR Younkin & CK Hohle (eds), Advances in Patterning Materials and Processes XXXIII., 977911, Proceedings of SPIE - The International Society for Optical Engineering, vol. 9779, SPIE, Advances in Patterning Materials and Processes XXXIII, San Jose, United States, 16/2/22. https://doi.org/10.1117/12.2221905

High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers. / Park, Sungmin; Jo, Seongjun; Lee, Yonghoon; Ryu, Chang Y.; Ryu, Du Yeol; Chun, Jun Sung.

Advances in Patterning Materials and Processes XXXIII. ed. / Todd R. Younkin; Christoph K. Hohle. SPIE, 2016. 977911 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9779).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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N2 - We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.

AB - We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.

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Park S, Jo S, Lee Y, Ryu CY, Ryu DY, Chun JS. High χ block copolymers based on chemical modification of poly(t -butyl acrylate) containing block copolymers. In Younkin TR, Hohle CK, editors, Advances in Patterning Materials and Processes XXXIII. SPIE. 2016. 977911. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.2221905