High-k TixSi1-xO2 thin films prepared by co-sputtering method

Sungyeon Kim, Moon Ho Ham, Byeong Yun Oh, Hyun Jae Kim, Jae Min Myoung

Research output: Contribution to journalArticle

4 Citations (Scopus)


We report on high-k TixSi1-xO2 thin films prepared by RF magnetron co-sputtering using TiO2 and SiO2 targets at room temperature. The TixSi1-xO2 thin films exhibited an amorphous structure with nanocrystalline grains of 3-30 nm having no interfacial layers. The XPS analyses indicate that stoichiometric TiO2 phases in the TixSi1-xO2 films increased due to stronger Ti-O bond with increasing TiO2 RF powers. In addition, the electrical properties of the TixSi1-xO2 films became better with increasing TiO2 RF powers, from which the maximum value of the dielectric constant was estimated to be ∼30 for the samples with TiO2 RF powers of 200 and 250 W. The transmittance of the TixSi1-xO2 films was above 95% with optical bandgap energies of 4.1-4.2 eV. These results demonstrate a potential that the TixSi1-xO2 thin films were applied to a high-k gate dielectric in transparent thin film transistors as well as metal-oxide-semiconductor field-effect transistors.

Original languageEnglish
Pages (from-to)100-103
Number of pages4
JournalMicroelectronic Engineering
Issue number1
Publication statusPublished - 2008 Jan 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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