TY - JOUR
T1 - High-mobility property of crystallized In-Te chalcogenide materials
AU - Park, Sung Jin
AU - Park, Seung Jong
AU - Park, Dambi
AU - An, Min
AU - Cho, Mann Ho
AU - Kim, Jonggi
AU - Na, Heedo
AU - Park, Sung Hoon
AU - Sohn, Hyunchul
PY - 2012/4
Y1 - 2012/4
N2 - In-Te films were deposited by ion beam sputtering deposition (IBSD) using In and Te targets. The crystallization characteristics of the resulting films were investigated by 4-point R s measurement, x-ray diffraction (XRD), transmission electron microscopy (TEM), and the Hall-effect measurement system. As the amount of In was increased in In-Te, the crystallization temperature increased. X-ray data for the crystalline structure show that phase separation to In 2Te 3 and InTe occurred in InTe and In 3Te 2 samples after annealing at 350°C. The value of carrier mobility and concentration decreased in order of In 2Te 3, In 3Te 2, and InTe. The decreasing value is caused by phase separation and is the unique property of chemical composition.
AB - In-Te films were deposited by ion beam sputtering deposition (IBSD) using In and Te targets. The crystallization characteristics of the resulting films were investigated by 4-point R s measurement, x-ray diffraction (XRD), transmission electron microscopy (TEM), and the Hall-effect measurement system. As the amount of In was increased in In-Te, the crystallization temperature increased. X-ray data for the crystalline structure show that phase separation to In 2Te 3 and InTe occurred in InTe and In 3Te 2 samples after annealing at 350°C. The value of carrier mobility and concentration decreased in order of In 2Te 3, In 3Te 2, and InTe. The decreasing value is caused by phase separation and is the unique property of chemical composition.
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U2 - 10.1007/s13391-012-2035-9
DO - 10.1007/s13391-012-2035-9
M3 - Article
AN - SCOPUS:84860532247
SN - 1738-8090
VL - 8
SP - 175
EP - 178
JO - Electronic Materials Letters
JF - Electronic Materials Letters
IS - 2
ER -