Abstract
We present the characterization of poly-Si TFT fabricated below 170°C on plastic substrate using excimer laser crystallization of Xe sputtered Si films. Gate insulator with a breakdown field exceeding 8 MV/cm was deposited by using inductively coupled plasma CVD. Finally, we successfully fabricate TFT with a electron field-effect mobility value greater than 290 cm 2/Vsec.
Original language | English |
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Pages (from-to) | 149-152 |
Number of pages | 4 |
Journal | Proceedings of International Meeting on Information Display |
Volume | 1 |
Publication status | Published - 2006 |
Event | 5th International Meeting on Information Display - Seoul, Korea, Republic of Duration: 2005 Jul 19 → 2005 Jul 23 |
All Science Journal Classification (ASJC) codes
- Engineering(all)