High-pressure Gas Activation for Amorphous Indium-Gallium-Zinc-Oxide Thin-Film Transistors at 100ºC

Won Gi Kim, Young Jun Tak, Byung Du Ahn, Tae Soo Jung, Kwun Bum Chung, Heon Je Kim

Research output: Contribution to journalArticle

Original languageEnglish
JournalScientific Reports
Volume6
Publication statusPublished - 2016 Mar

Cite this