High spatial density nanocrystal formation using thin layer of amorphous Si0.7Ge0.3 deposited on SiO2

Tae Sik Yoon, Jang Yeon Kwon, Dong Hoon Lee, Ki Bum Kim, Seok Hong Min, Dong Hyuk Chae, Dae Hwan Kim, Jong Duk Lee, Byung Gook Park, Hwack Joo Lee

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