High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head

Taeseob Kim, Won Sup Lee, Hang Eun Joe, Geon Lim, Guk Jong Choi, Myeong Gu Gang, Sung Mook Kang, Kyoung Su Park, Byung Kwon Min, Young Pil Park, No Cheol Park

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13 Citations (Scopus)

Abstract

This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produced by evanescent coupling through the air-gap. We demonstrate that a plasmonic optical head achieves a patterning resolution of 70 nm and a patterning speed of 100 mm/s. The proposed combination of a surface plasmon nanoaperture and a nanogap servo system is one of the strategies used to achieve high-speed, high-resolution nanolithography.

Original languageEnglish
Article number161109
JournalApplied Physics Letters
Volume101
Issue number16
DOIs
Publication statusPublished - 2012 Oct 15

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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    Kim, T., Lee, W. S., Joe, H. E., Lim, G., Choi, G. J., Gang, M. G., Kang, S. M., Park, K. S., Min, B. K., Park, Y. P., & Park, N. C. (2012). High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head. Applied Physics Letters, 101(16), [161109]. https://doi.org/10.1063/1.4760263