High-throughput GaP microprobe array having uniform aperture size distribution for near-field optical memory

Kazuma Kurihara, Young Joo Kim, Kenya Goto

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

The GaP metal-aperture microprobe array has been studied for application to the parallel near-field optical array head of high memory capacity and fast data transfer rate. The fabrication of such an array having uniform aperture size distribution was realized using a low-temperature etching solution of HF:HNO3 and the careful control of ion-milling parameters. After the flat-tip formation by the wet etching method and the aperture formation by the ion-milling process. GaP microprobes of more than 90% in the array show an acceptable size distribution in the range of 150 ± 30 nm. It was observed from the near field scanning optical microscope (NSOM) observation that tiny apertures are formed on the top of the microprobes and light comes out only from the aperture. The light penetrated through the 200 nm aperture shows approximately 170 nm beam size in full width half maximum (FWHM). Due to the high refractive index, the cut-off diameter of GaP microprobes decreases to approximately 200 nm, resulting in improved optical throughput with more than 100 times increment compared with that of the conventional optical fiber probe. For the microprobe having 150 nm aperture, 1.25% optical throughput was realized in this research. The design concept for the semiconductor microprobe array having high optical throughput with uniform aperture size distribution has been proved experimentally.

Original languageEnglish
Pages (from-to)2034-2039
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume41
Issue number4
Publication statusPublished - 2002 Apr 1

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Optical data storage
near fields
apertures
Throughput
Data transfer rates
Wet etching
Ions
Optical fibers
Etching
Refractive index
Microscopes
Semiconductor materials
Scanning
Data storage equipment
Fabrication
etching
Metals
optical microscopes
Temperature
ions

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

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abstract = "The GaP metal-aperture microprobe array has been studied for application to the parallel near-field optical array head of high memory capacity and fast data transfer rate. The fabrication of such an array having uniform aperture size distribution was realized using a low-temperature etching solution of HF:HNO3 and the careful control of ion-milling parameters. After the flat-tip formation by the wet etching method and the aperture formation by the ion-milling process. GaP microprobes of more than 90{\%} in the array show an acceptable size distribution in the range of 150 ± 30 nm. It was observed from the near field scanning optical microscope (NSOM) observation that tiny apertures are formed on the top of the microprobes and light comes out only from the aperture. The light penetrated through the 200 nm aperture shows approximately 170 nm beam size in full width half maximum (FWHM). Due to the high refractive index, the cut-off diameter of GaP microprobes decreases to approximately 200 nm, resulting in improved optical throughput with more than 100 times increment compared with that of the conventional optical fiber probe. For the microprobe having 150 nm aperture, 1.25{\%} optical throughput was realized in this research. The design concept for the semiconductor microprobe array having high optical throughput with uniform aperture size distribution has been proved experimentally.",
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