High throughput plasmonic lithography for sub 50nm patterning with a contact probe

Yongwoo Kim, Seok Kim, Howon Jung, Jae W. Hahn

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

We suggest near-field optical lithography that uses contact probe for high speed patterning. The contact probe contains high transmission metal nano aperture and cover-layer for gap distance formation without external feed-back control unit. For contact mode operation, lubricant layer is applied between probe and photoresist surface. Using this contact probe, we recorded 50nm width line pattern with 10mm/s which is 500 times faster than conventional near-field scanning optical microscope lithography. The various line patterns having are recorded as increasing exposure dose and pattern qualities such as line width roughness (LWR) and depth roughness (DR) are evaluated. We expect the contact probe could be extended array probe lithography system for high throughput plasmonic lithography for mass production.

Original languageEnglish
Title of host publicationAlternative Lithographic Technologies II
DOIs
Publication statusPublished - 2010 Jun 15
EventAlternative Lithographic Technologies II - San Jose, CA, United States
Duration: 2010 Feb 232010 Feb 25

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7637
ISSN (Print)0277-786X

Other

OtherAlternative Lithographic Technologies II
CountryUnited States
CitySan Jose, CA
Period10/2/2310/2/25

Fingerprint

Plasmonics
Patterning
Lithography
High Throughput
Probe
lithography
Throughput
Contact
probes
Linewidth
Near-field
Roughness
near fields
roughness
Surface roughness
Optical Lithography
Photoresist
Photolithography
Photoresists
lubricants

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Kim, Y., Kim, S., Jung, H., & Hahn, J. W. (2010). High throughput plasmonic lithography for sub 50nm patterning with a contact probe. In Alternative Lithographic Technologies II [76371F] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7637). https://doi.org/10.1117/12.848329
Kim, Yongwoo ; Kim, Seok ; Jung, Howon ; Hahn, Jae W. / High throughput plasmonic lithography for sub 50nm patterning with a contact probe. Alternative Lithographic Technologies II. 2010. (Proceedings of SPIE - The International Society for Optical Engineering).
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Kim, Y, Kim, S, Jung, H & Hahn, JW 2010, High throughput plasmonic lithography for sub 50nm patterning with a contact probe. in Alternative Lithographic Technologies II., 76371F, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7637, Alternative Lithographic Technologies II, San Jose, CA, United States, 10/2/23. https://doi.org/10.1117/12.848329

High throughput plasmonic lithography for sub 50nm patterning with a contact probe. / Kim, Yongwoo; Kim, Seok; Jung, Howon; Hahn, Jae W.

Alternative Lithographic Technologies II. 2010. 76371F (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7637).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Kim Y, Kim S, Jung H, Hahn JW. High throughput plasmonic lithography for sub 50nm patterning with a contact probe. In Alternative Lithographic Technologies II. 2010. 76371F. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.848329