Highly fluorescent anthracene polymers for direct photo patterning

Krishnamurthy Rameshbabu, Jungmok Yoo, Eunkyoung Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Highly fluorescent anthracene polymers, linked by a alkylene unit, were examined for fluorescent patterning. The anthracene polymers were soluble in organic solvent such as chloroform, which allowed solution processing to afford fluorescent thin films using the spin coating method. The fluorescence intensity of the polymer solution as well as film was decreased upon exposure to a high energy UV source, due to the photodimerization of anthracene unit. Utilizing such fluorescence decay, a fluorescent polymer pattern was directly developed from the thin film using a photomask. The photo-patterning of the fluorescent anthracene polymer film afforded a convenient method of image formation and patterning of gap electrode.

Original languageEnglish
Title of host publicationNIP 23, 23rd International Conference on Digital Printing Technologies, Technical Program and Proceedings and Digital Fabrication 2007
Pages708-710
Number of pages3
Publication statusPublished - 2007 Dec 28
EventNIP 23, 23rd International Conference on Digital Printing Technologies, and Digital Fabrication 2007 - Anchorage, AK, United States
Duration: 2007 Sep 162007 Sep 21

Other

OtherNIP 23, 23rd International Conference on Digital Printing Technologies, and Digital Fabrication 2007
CountryUnited States
CityAnchorage, AK
Period07/9/1607/9/21

Fingerprint

Anthracene
Polymers
Fluorescence
Thin films
Photomasks
Spin coating
Polymer solutions
Chlorine compounds
Polymer films
Organic solvents
Image processing
Electrodes
Processing

All Science Journal Classification (ASJC) codes

  • Media Technology
  • Computer Science Applications

Cite this

Rameshbabu, K., Yoo, J., & Kim, E. (2007). Highly fluorescent anthracene polymers for direct photo patterning. In NIP 23, 23rd International Conference on Digital Printing Technologies, Technical Program and Proceedings and Digital Fabrication 2007 (pp. 708-710)
Rameshbabu, Krishnamurthy ; Yoo, Jungmok ; Kim, Eunkyoung. / Highly fluorescent anthracene polymers for direct photo patterning. NIP 23, 23rd International Conference on Digital Printing Technologies, Technical Program and Proceedings and Digital Fabrication 2007. 2007. pp. 708-710
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Rameshbabu, K, Yoo, J & Kim, E 2007, Highly fluorescent anthracene polymers for direct photo patterning. in NIP 23, 23rd International Conference on Digital Printing Technologies, Technical Program and Proceedings and Digital Fabrication 2007. pp. 708-710, NIP 23, 23rd International Conference on Digital Printing Technologies, and Digital Fabrication 2007, Anchorage, AK, United States, 07/9/16.

Highly fluorescent anthracene polymers for direct photo patterning. / Rameshbabu, Krishnamurthy; Yoo, Jungmok; Kim, Eunkyoung.

NIP 23, 23rd International Conference on Digital Printing Technologies, Technical Program and Proceedings and Digital Fabrication 2007. 2007. p. 708-710.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Rameshbabu K, Yoo J, Kim E. Highly fluorescent anthracene polymers for direct photo patterning. In NIP 23, 23rd International Conference on Digital Printing Technologies, Technical Program and Proceedings and Digital Fabrication 2007. 2007. p. 708-710