Highly reliable and scalable tungsten polymetal gate process for memory devices using low-temperature plasma selective gate reoxidation

Kwan Yong Lim, Min Gyu Sung, Heung Jae Cho, Yong Soo Kim, Se Aug Jang, Jae Geun Oh, Seung Ryong Lee, Kwangok Kim, Pil Soo Lee, Yun Seok Chun, Hong Seon Yang, Noh Jung Kwak, Hyun Chul Sohn, Jin Woong Kim, Sung Wook Park

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

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Engineering & Materials Science