Highly stable double-gate Ga-In-Zn-O thin-film transistor

Kyoung Seok Son, Ji Sim Jung, Kwang Hee Lee, Tae Sang Kim, Joon Seok Park, Keechan Park, Jang Yeon Kwon, Bonwon Koo, Sang Yoon Lee

Research output: Contribution to journalArticlepeer-review

42 Citations (Scopus)


We report the electrical stability of double-gate (DG) Ga-In-Zn-O thin-film transistors (TFTs). The threshold voltage (VT) shift of the DG TFT after 3 h of positivebias temperature stress (VGS = +20 V, V DS = +0.1 V, and Temperature = 60 °C) is as small as +2.7 V, while that of a conventional single-gate (SG) TFT is +6.6 V. The results of negative-bias temperature stress [(NBTS); VGS =.20 V, VDS = +10 V, and Temperature = 60 °C] are more dramatic: The VT shift of the DG TFT is only +0.1 V, whereas that of the SG TFT is.9.1 V. With backlight illumination, the VT shift of the SG TFT under the same NBTS becomes severe (.11.1 V). However, it remains as small as.0.7 V for the DG TFT.

Original languageEnglish
Article number5491056
Pages (from-to)812-814
Number of pages3
JournalIEEE Electron Device Letters
Issue number8
Publication statusPublished - 2010 Aug

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


Dive into the research topics of 'Highly stable double-gate Ga-In-Zn-O thin-film transistor'. Together they form a unique fingerprint.

Cite this