HMDS treatment of ordered mesoporous silica film for low dielectric application

Chemistry

• Ordered Mesoporous Silica 75%
• Hexamethyldisilazane 66%
• Liquid Film 41%
• Dielectric Constant 25%
• Procedure 25%
• Dielectric Material 16%
• Group 16%
• Surfactant 8%
• Aqueous Solution 8%
• Surface Modification 8%
• Hexane 8%
• Spin Coating 8%
• Surface 8%
• Mechanical Property 8%
• Application 8%

Material Science

• Silicon Dioxide 100%
• Liquid Films 41%
• Dielectric Material 16%
• Surface Active Agent 8%
• Solution 8%
• Surface 8%
• Mechanical Property 8%
• Material 8%

Engineering

• Tetraethyl Orthosilicate 25%
• Modified Surface 8%
• Applications 8%
• Surfaces 8%
• Mechanical Properties 8%