Hydrophobicity of rare earth oxides grown by atomic layer deposition

Il Kwon Oh, Kangsik Kim, Zonghoon Lee, Kyung Yong Ko, Chang Wan Lee, Su Jeong Lee, Jae Min Myung, Clement Lansalot-Matras, Wontae Noh, Christian Dussarrat, Hyungjun Kim, Han Bo Ram Lee

Research output: Contribution to journalArticle

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Abstract

Rare earth oxide (REO) atomic layer deposition (ALD) processes are investigated for hydrophobic coatings. Thermal and plasma-enhanced ALD (PE-ALD) Er2O3 and Dy2O3 are developed using the newly synthesized Er and Dy precursors bis-methylcyclopentadienyl-diisopropyl-acetamidinate-erbium and bis-isopropylcyclopentadienyl-diisopropyl-acetamidinate-dysprosium, with H2O and O2 plasma counter oxidants. The Er and Dy precursors show typical ALD growth characteristics with no nucleation incubation, indicating that they are suitable ALD precursors. The hydrophobicities of ALD-grown Er2O3 and Dy2O3 are investigated, together with those of ALD-grown Y2O3, La2O3, and CeO2 that were previously developed for high-k applications. All the ALD-grown REOs show high hydrophobicity, with water contact angles as high as 90°. After annealing at 500 °C in air for 2 h, hydrophobicity is degraded depending on the kind of material; this degradation is related to the hygroscopy of REOs. In addition, we demonstrate the fabrication of a superhydrophobic surface by depositing highly conformal ALD REO films on 3D Si nanowire nanostructures. The Si NWs are conformally coated with ALD Y2O3, yielding a surface with a water contact angle of about 158°. The ALD REOs reported herein should find widespread applicability in the fabrication of robust hydrophobic coatings.

Original languageEnglish
Pages (from-to)148-156
Number of pages9
JournalChemistry of Materials
Volume27
Issue number1
DOIs
Publication statusPublished - 2015 Jan 13

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Atomic layer deposition
Hydrophobicity
Oxides
Rare earths
Contact angle
Dysprosium
Erbium
Plasma Gases
Plasmas
Fabrication
Coatings
Water
Oxidants
Oxide films
Nanowires
Nanostructures
Nucleation
Annealing
Degradation

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

Cite this

Oh, I. K., Kim, K., Lee, Z., Ko, K. Y., Lee, C. W., Lee, S. J., ... Lee, H. B. R. (2015). Hydrophobicity of rare earth oxides grown by atomic layer deposition. Chemistry of Materials, 27(1), 148-156. https://doi.org/10.1021/cm503659d
Oh, Il Kwon ; Kim, Kangsik ; Lee, Zonghoon ; Ko, Kyung Yong ; Lee, Chang Wan ; Lee, Su Jeong ; Myung, Jae Min ; Lansalot-Matras, Clement ; Noh, Wontae ; Dussarrat, Christian ; Kim, Hyungjun ; Lee, Han Bo Ram. / Hydrophobicity of rare earth oxides grown by atomic layer deposition. In: Chemistry of Materials. 2015 ; Vol. 27, No. 1. pp. 148-156.
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Oh, IK, Kim, K, Lee, Z, Ko, KY, Lee, CW, Lee, SJ, Myung, JM, Lansalot-Matras, C, Noh, W, Dussarrat, C, Kim, H & Lee, HBR 2015, 'Hydrophobicity of rare earth oxides grown by atomic layer deposition', Chemistry of Materials, vol. 27, no. 1, pp. 148-156. https://doi.org/10.1021/cm503659d

Hydrophobicity of rare earth oxides grown by atomic layer deposition. / Oh, Il Kwon; Kim, Kangsik; Lee, Zonghoon; Ko, Kyung Yong; Lee, Chang Wan; Lee, Su Jeong; Myung, Jae Min; Lansalot-Matras, Clement; Noh, Wontae; Dussarrat, Christian; Kim, Hyungjun; Lee, Han Bo Ram.

In: Chemistry of Materials, Vol. 27, No. 1, 13.01.2015, p. 148-156.

Research output: Contribution to journalArticle

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T1 - Hydrophobicity of rare earth oxides grown by atomic layer deposition

AU - Oh, Il Kwon

AU - Kim, Kangsik

AU - Lee, Zonghoon

AU - Ko, Kyung Yong

AU - Lee, Chang Wan

AU - Lee, Su Jeong

AU - Myung, Jae Min

AU - Lansalot-Matras, Clement

AU - Noh, Wontae

AU - Dussarrat, Christian

AU - Kim, Hyungjun

AU - Lee, Han Bo Ram

PY - 2015/1/13

Y1 - 2015/1/13

N2 - Rare earth oxide (REO) atomic layer deposition (ALD) processes are investigated for hydrophobic coatings. Thermal and plasma-enhanced ALD (PE-ALD) Er2O3 and Dy2O3 are developed using the newly synthesized Er and Dy precursors bis-methylcyclopentadienyl-diisopropyl-acetamidinate-erbium and bis-isopropylcyclopentadienyl-diisopropyl-acetamidinate-dysprosium, with H2O and O2 plasma counter oxidants. The Er and Dy precursors show typical ALD growth characteristics with no nucleation incubation, indicating that they are suitable ALD precursors. The hydrophobicities of ALD-grown Er2O3 and Dy2O3 are investigated, together with those of ALD-grown Y2O3, La2O3, and CeO2 that were previously developed for high-k applications. All the ALD-grown REOs show high hydrophobicity, with water contact angles as high as 90°. After annealing at 500 °C in air for 2 h, hydrophobicity is degraded depending on the kind of material; this degradation is related to the hygroscopy of REOs. In addition, we demonstrate the fabrication of a superhydrophobic surface by depositing highly conformal ALD REO films on 3D Si nanowire nanostructures. The Si NWs are conformally coated with ALD Y2O3, yielding a surface with a water contact angle of about 158°. The ALD REOs reported herein should find widespread applicability in the fabrication of robust hydrophobic coatings.

AB - Rare earth oxide (REO) atomic layer deposition (ALD) processes are investigated for hydrophobic coatings. Thermal and plasma-enhanced ALD (PE-ALD) Er2O3 and Dy2O3 are developed using the newly synthesized Er and Dy precursors bis-methylcyclopentadienyl-diisopropyl-acetamidinate-erbium and bis-isopropylcyclopentadienyl-diisopropyl-acetamidinate-dysprosium, with H2O and O2 plasma counter oxidants. The Er and Dy precursors show typical ALD growth characteristics with no nucleation incubation, indicating that they are suitable ALD precursors. The hydrophobicities of ALD-grown Er2O3 and Dy2O3 are investigated, together with those of ALD-grown Y2O3, La2O3, and CeO2 that were previously developed for high-k applications. All the ALD-grown REOs show high hydrophobicity, with water contact angles as high as 90°. After annealing at 500 °C in air for 2 h, hydrophobicity is degraded depending on the kind of material; this degradation is related to the hygroscopy of REOs. In addition, we demonstrate the fabrication of a superhydrophobic surface by depositing highly conformal ALD REO films on 3D Si nanowire nanostructures. The Si NWs are conformally coated with ALD Y2O3, yielding a surface with a water contact angle of about 158°. The ALD REOs reported herein should find widespread applicability in the fabrication of robust hydrophobic coatings.

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