Improved air gap error using frequency estimation and peak filter in solid immersion lens-based plasmonic lithography system

Guk Jong Choi, Geon Lim, Taeseob Kim, Won Sup Lee, No Cheol Park, Yonug Pil Park, Hyunseok Yang, Kyoung Su Park

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The performance of plasmonic lithography depends on how small the air gap is. In this paper, we focus on rejecting the dominant frequency of disturbance. In order to do this, frequency estimation and peak filter are used in this paper. We achieve about 12% and 10% reduction in the standard deviation and maximum peak to peak of Gap Error Signal (GES) respectively. This work will improve the quality of plasmonic lithography in the size and stability of patterns.

Original languageEnglish
Title of host publicationASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013
DOIs
Publication statusPublished - 2013
EventASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013 - Santa Clara, CA, United States
Duration: 2013 Jun 242013 Jun 25

Publication series

NameASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013

Other

OtherASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013
CountryUnited States
CitySanta Clara, CA
Period13/6/2413/6/25

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Information Systems
  • Control and Systems Engineering

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    Choi, G. J., Lim, G., Kim, T., Lee, W. S., Park, N. C., Park, Y. P., Yang, H., & Park, K. S. (2013). Improved air gap error using frequency estimation and peak filter in solid immersion lens-based plasmonic lithography system. In ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013 [V001T09A005] (ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013). https://doi.org/10.1115/ISPS2013-2869