Improved air gap error using frequency estimation and peak filter in solid immersion lens-based plasmonic lithography system

Guk Jong Choi, Geon Lim, Taeseob Kim, Won Sup Lee, No Cheol Park, Yonug Pil Park, Hyun Seok Yang, Kyoung Su Park

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The performance of plasmonic lithography depends on how small the air gap is. In this paper, we focus on rejecting the dominant frequency of disturbance. In order to do this, frequency estimation and peak filter are used in this paper. We achieve about 12% and 10% reduction in the standard deviation and maximum peak to peak of Gap Error Signal (GES) respectively. This work will improve the quality of plasmonic lithography in the size and stability of patterns.

Original languageEnglish
Title of host publicationASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013
DOIs
Publication statusPublished - 2013 Dec 1
EventASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013 - Santa Clara, CA, United States
Duration: 2013 Jun 242013 Jun 25

Publication series

NameASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013

Other

OtherASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013
CountryUnited States
CitySanta Clara, CA
Period13/6/2413/6/25

Fingerprint

Frequency estimation
Lithography
Lenses
Air

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Information Systems
  • Control and Systems Engineering

Cite this

Choi, G. J., Lim, G., Kim, T., Lee, W. S., Park, N. C., Park, Y. P., ... Park, K. S. (2013). Improved air gap error using frequency estimation and peak filter in solid immersion lens-based plasmonic lithography system. In ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013 [V001T09A005] (ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013). https://doi.org/10.1115/ISPS2013-2869
Choi, Guk Jong ; Lim, Geon ; Kim, Taeseob ; Lee, Won Sup ; Park, No Cheol ; Park, Yonug Pil ; Yang, Hyun Seok ; Park, Kyoung Su. / Improved air gap error using frequency estimation and peak filter in solid immersion lens-based plasmonic lithography system. ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013. 2013. (ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013).
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abstract = "The performance of plasmonic lithography depends on how small the air gap is. In this paper, we focus on rejecting the dominant frequency of disturbance. In order to do this, frequency estimation and peak filter are used in this paper. We achieve about 12{\%} and 10{\%} reduction in the standard deviation and maximum peak to peak of Gap Error Signal (GES) respectively. This work will improve the quality of plasmonic lithography in the size and stability of patterns.",
author = "Choi, {Guk Jong} and Geon Lim and Taeseob Kim and Lee, {Won Sup} and Park, {No Cheol} and Park, {Yonug Pil} and Yang, {Hyun Seok} and Park, {Kyoung Su}",
year = "2013",
month = "12",
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doi = "10.1115/ISPS2013-2869",
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Choi, GJ, Lim, G, Kim, T, Lee, WS, Park, NC, Park, YP, Yang, HS & Park, KS 2013, Improved air gap error using frequency estimation and peak filter in solid immersion lens-based plasmonic lithography system. in ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013., V001T09A005, ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013, ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013, Santa Clara, CA, United States, 13/6/24. https://doi.org/10.1115/ISPS2013-2869

Improved air gap error using frequency estimation and peak filter in solid immersion lens-based plasmonic lithography system. / Choi, Guk Jong; Lim, Geon; Kim, Taeseob; Lee, Won Sup; Park, No Cheol; Park, Yonug Pil; Yang, Hyun Seok; Park, Kyoung Su.

ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013. 2013. V001T09A005 (ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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AU - Park, Yonug Pil

AU - Yang, Hyun Seok

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Choi GJ, Lim G, Kim T, Lee WS, Park NC, Park YP et al. Improved air gap error using frequency estimation and peak filter in solid immersion lens-based plasmonic lithography system. In ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013. 2013. V001T09A005. (ASME 2013 Conference on Information Storage and Processing Systems, ISPS 2013). https://doi.org/10.1115/ISPS2013-2869