Improved growth behavior of atomic-layer-deposited high- k dielectrics on multilayer MoS2 by oxygen plasma pretreatment

Jaehyun Yang, Sunkook Kim, Woong Choi, Sang Han Park, Youngkwon Jung, Mann Ho Cho, Hyoungsub Kim

Research output: Contribution to journalArticlepeer-review

139 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds