Improved nanogap servo system using an error-based disturbance observer for high-speed in solid immersion lens-based plasmonic lithography

Geon Lim, Taeseob Kim, Won Sup Lee, Guk Jong Choi, Kyoung Su Park, Young Pil Park, Hyunseok Yang, No Cheol Park

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We proposed an advanced nanogap servo system using the error-based disturbance observer (EDOB) system. To achieve the feedback control over the nanogap based on the gap error signal (GES) in the near-field region, a precise gap-curve was obtained experimentally between a solid immersion lens and a photoresist-coated wafer using a piezo nanoposition actuator. With an accurate nanogap servo system, the EDOB was designed with a low-pass filter of 2.0 kHz bandwidth. Due to the powerful properties of the EDOB, which include stable robustness and disturbance rejection, a high-speed nanogap servo was achieved with up to 400 and 300 mm/s at the desired gaps of 20 and 15 nm, respectively. The disturbance rejection performance was evaluated from the GES, and the maximum deviation value was reduced by approximately 40% over that of the servo system without the EDOB.

Original languageEnglish
Article number09LG02
JournalJapanese journal of applied physics
Volume52
Issue number9 PART3
DOIs
Publication statusPublished - 2013 Sep 1

Fingerprint

Servomechanisms
Lithography
submerging
Lenses
disturbances
lithography
lenses
high speed
error signals
Disturbance rejection
rejection
low pass filters
Low pass filters
Photoresists
Robustness (control systems)
feedback control
photoresists
Feedback control
near fields
Actuators

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

@article{fcd6d0772a444667b1eefe266224587c,
title = "Improved nanogap servo system using an error-based disturbance observer for high-speed in solid immersion lens-based plasmonic lithography",
abstract = "We proposed an advanced nanogap servo system using the error-based disturbance observer (EDOB) system. To achieve the feedback control over the nanogap based on the gap error signal (GES) in the near-field region, a precise gap-curve was obtained experimentally between a solid immersion lens and a photoresist-coated wafer using a piezo nanoposition actuator. With an accurate nanogap servo system, the EDOB was designed with a low-pass filter of 2.0 kHz bandwidth. Due to the powerful properties of the EDOB, which include stable robustness and disturbance rejection, a high-speed nanogap servo was achieved with up to 400 and 300 mm/s at the desired gaps of 20 and 15 nm, respectively. The disturbance rejection performance was evaluated from the GES, and the maximum deviation value was reduced by approximately 40{\%} over that of the servo system without the EDOB.",
author = "Geon Lim and Taeseob Kim and Lee, {Won Sup} and Choi, {Guk Jong} and Park, {Kyoung Su} and Park, {Young Pil} and Hyunseok Yang and Park, {No Cheol}",
year = "2013",
month = "9",
day = "1",
doi = "10.7567/JJAP.52.09LG02",
language = "English",
volume = "52",
journal = "Japanese Journal of Applied Physics",
issn = "0021-4922",
number = "9 PART3",

}

Improved nanogap servo system using an error-based disturbance observer for high-speed in solid immersion lens-based plasmonic lithography. / Lim, Geon; Kim, Taeseob; Lee, Won Sup; Choi, Guk Jong; Park, Kyoung Su; Park, Young Pil; Yang, Hyunseok; Park, No Cheol.

In: Japanese journal of applied physics, Vol. 52, No. 9 PART3, 09LG02, 01.09.2013.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Improved nanogap servo system using an error-based disturbance observer for high-speed in solid immersion lens-based plasmonic lithography

AU - Lim, Geon

AU - Kim, Taeseob

AU - Lee, Won Sup

AU - Choi, Guk Jong

AU - Park, Kyoung Su

AU - Park, Young Pil

AU - Yang, Hyunseok

AU - Park, No Cheol

PY - 2013/9/1

Y1 - 2013/9/1

N2 - We proposed an advanced nanogap servo system using the error-based disturbance observer (EDOB) system. To achieve the feedback control over the nanogap based on the gap error signal (GES) in the near-field region, a precise gap-curve was obtained experimentally between a solid immersion lens and a photoresist-coated wafer using a piezo nanoposition actuator. With an accurate nanogap servo system, the EDOB was designed with a low-pass filter of 2.0 kHz bandwidth. Due to the powerful properties of the EDOB, which include stable robustness and disturbance rejection, a high-speed nanogap servo was achieved with up to 400 and 300 mm/s at the desired gaps of 20 and 15 nm, respectively. The disturbance rejection performance was evaluated from the GES, and the maximum deviation value was reduced by approximately 40% over that of the servo system without the EDOB.

AB - We proposed an advanced nanogap servo system using the error-based disturbance observer (EDOB) system. To achieve the feedback control over the nanogap based on the gap error signal (GES) in the near-field region, a precise gap-curve was obtained experimentally between a solid immersion lens and a photoresist-coated wafer using a piezo nanoposition actuator. With an accurate nanogap servo system, the EDOB was designed with a low-pass filter of 2.0 kHz bandwidth. Due to the powerful properties of the EDOB, which include stable robustness and disturbance rejection, a high-speed nanogap servo was achieved with up to 400 and 300 mm/s at the desired gaps of 20 and 15 nm, respectively. The disturbance rejection performance was evaluated from the GES, and the maximum deviation value was reduced by approximately 40% over that of the servo system without the EDOB.

UR - http://www.scopus.com/inward/record.url?scp=84884696853&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84884696853&partnerID=8YFLogxK

U2 - 10.7567/JJAP.52.09LG02

DO - 10.7567/JJAP.52.09LG02

M3 - Article

AN - SCOPUS:84884696853

VL - 52

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

SN - 0021-4922

IS - 9 PART3

M1 - 09LG02

ER -