Improvement in current density of nano- and micro-structured Si solar cells by cost-effective elastomeric stamp process

Kiseok Jeon, Hongsub Jee, Sangwoo Lim, Min Joon Park, Chaehwan Jeong

Research output: Contribution to journalArticle

Abstract

Effective incident light should be controlled for improving the current density of solar cells by employing nano- and micro-structures on silicon surface. The elastomeric stamp process, which is more cost effective and simpler than conventional photolithography, was proposed for the fabrication of nano- and micro-structures. Polydimethylsiloxane (PDMS) was poured on a mother pattern with a diameter of 6 μm and a spacing of 2 μm; then, curing was performed to create a PDMS mold. The regular micropattern was stamped on a low-viscosity resin-coated silicon surface, followed by the simple reactive ion etching process. Nano-structures were formed using the Ag-based electroless etching process. As etching time was increased to 6 min, reflectance decreased to 4.53% and current density improved from 22.35 to 34.72 mA/cm2.

Original languageEnglish
Article number035203
JournalAIP Advances
Volume8
Issue number3
DOIs
Publication statusPublished - 2018 Mar 1

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solar cells
etching
current density
costs
microstructure
silicon
photolithography
curing
resins
spacing
viscosity
reflectance
fabrication
ions

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

@article{843799a0054e4dd3b548e2c5bddc7c4e,
title = "Improvement in current density of nano- and micro-structured Si solar cells by cost-effective elastomeric stamp process",
abstract = "Effective incident light should be controlled for improving the current density of solar cells by employing nano- and micro-structures on silicon surface. The elastomeric stamp process, which is more cost effective and simpler than conventional photolithography, was proposed for the fabrication of nano- and micro-structures. Polydimethylsiloxane (PDMS) was poured on a mother pattern with a diameter of 6 μm and a spacing of 2 μm; then, curing was performed to create a PDMS mold. The regular micropattern was stamped on a low-viscosity resin-coated silicon surface, followed by the simple reactive ion etching process. Nano-structures were formed using the Ag-based electroless etching process. As etching time was increased to 6 min, reflectance decreased to 4.53{\%} and current density improved from 22.35 to 34.72 mA/cm2.",
author = "Kiseok Jeon and Hongsub Jee and Sangwoo Lim and Park, {Min Joon} and Chaehwan Jeong",
year = "2018",
month = "3",
day = "1",
doi = "10.1063/1.5013298",
language = "English",
volume = "8",
journal = "AIP Advances",
issn = "2158-3226",
publisher = "American Institute of Physics Publising LLC",
number = "3",

}

Improvement in current density of nano- and micro-structured Si solar cells by cost-effective elastomeric stamp process. / Jeon, Kiseok; Jee, Hongsub; Lim, Sangwoo; Park, Min Joon; Jeong, Chaehwan.

In: AIP Advances, Vol. 8, No. 3, 035203, 01.03.2018.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Improvement in current density of nano- and micro-structured Si solar cells by cost-effective elastomeric stamp process

AU - Jeon, Kiseok

AU - Jee, Hongsub

AU - Lim, Sangwoo

AU - Park, Min Joon

AU - Jeong, Chaehwan

PY - 2018/3/1

Y1 - 2018/3/1

N2 - Effective incident light should be controlled for improving the current density of solar cells by employing nano- and micro-structures on silicon surface. The elastomeric stamp process, which is more cost effective and simpler than conventional photolithography, was proposed for the fabrication of nano- and micro-structures. Polydimethylsiloxane (PDMS) was poured on a mother pattern with a diameter of 6 μm and a spacing of 2 μm; then, curing was performed to create a PDMS mold. The regular micropattern was stamped on a low-viscosity resin-coated silicon surface, followed by the simple reactive ion etching process. Nano-structures were formed using the Ag-based electroless etching process. As etching time was increased to 6 min, reflectance decreased to 4.53% and current density improved from 22.35 to 34.72 mA/cm2.

AB - Effective incident light should be controlled for improving the current density of solar cells by employing nano- and micro-structures on silicon surface. The elastomeric stamp process, which is more cost effective and simpler than conventional photolithography, was proposed for the fabrication of nano- and micro-structures. Polydimethylsiloxane (PDMS) was poured on a mother pattern with a diameter of 6 μm and a spacing of 2 μm; then, curing was performed to create a PDMS mold. The regular micropattern was stamped on a low-viscosity resin-coated silicon surface, followed by the simple reactive ion etching process. Nano-structures were formed using the Ag-based electroless etching process. As etching time was increased to 6 min, reflectance decreased to 4.53% and current density improved from 22.35 to 34.72 mA/cm2.

UR - http://www.scopus.com/inward/record.url?scp=85043344439&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85043344439&partnerID=8YFLogxK

U2 - 10.1063/1.5013298

DO - 10.1063/1.5013298

M3 - Article

AN - SCOPUS:85043344439

VL - 8

JO - AIP Advances

JF - AIP Advances

SN - 2158-3226

IS - 3

M1 - 035203

ER -