Improvement of Ta diffusion barrier performance in Cu metallization by insertion of a thin Zr layer into Ta film

Joon Seop Kwak, Hong Koo Baik, Jong Hoon Kim, Sung Man Lee

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Fingerprint Dive into the research topics of 'Improvement of Ta diffusion barrier performance in Cu metallization by insertion of a thin Zr layer into Ta film'. Together they form a unique fingerprint.

Physics & Astronomy